Christopher H. Raeder

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Triple layer anti-reflective hard mask
- Patent number 7,888,269
- Issue date Feb 15, 2011
- Spansion LLC
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-critical complementary masking method for poly-1 definition in...
- Patent number 7,307,002
- Issue date Dec 11, 2007
- Spansion LLC
- Unsoon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing uniformity via pad conditioning
- Patent number 7,008,301
- Issue date Mar 7, 2006
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for post-polish thickness and uniformity control
- Patent number 6,540,591
- Issue date Apr 1, 2003
- Alexander J. Pasadyn
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for filling trenches
- Patent number 6,454,899
- Issue date Sep 24, 2002
- Advanced Micro Devices, Inc.
- William J. Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Infrared inspection for determining residual films on semiconductor...
- Patent number 6,452,180
- Issue date Sep 17, 2002
- Advanced Micro Devices, Inc.
- John L. Nistler
- G01 - MEASURING TESTING
Information Patent Grant
Method and product for improved use of low k dielectric material am...
- Patent number 6,444,564
- Issue date Sep 3, 2002
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotary chemical-mechanical polishing apparatus employing multiple f...
- Patent number 6,379,216
- Issue date Apr 30, 2002
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having open area which varies with distance from init...
- Patent number 6,331,137
- Issue date Dec 18, 2001
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- B24 - GRINDING POLISHING
Information Patent Grant
Method for filling trenches
- Patent number 6,284,622
- Issue date Sep 4, 2001
- Advanced Micro Devices, Inc.
- William J. Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling within-wafer uniformity in che...
- Patent number 6,276,989
- Issue date Aug 21, 2001
- Advanced Micro Devices, Inc.
- W. Jarrett Campbell
- B24 - GRINDING POLISHING
Information Patent Grant
System and method for controlling a multi-arm polishing tool
- Patent number 6,171,174
- Issue date Jan 9, 2001
- Advanced Micro Devices
- William Jarrett Campbell
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
System and method for independent air bearing zoning for semiconduc...
- Patent number 6,155,915
- Issue date Dec 5, 2000
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having a wear level indicator and system using the same
- Patent number 6,106,661
- Issue date Aug 22, 2000
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- B24 - GRINDING POLISHING
Information Patent Grant
Method for determining the efficiency of a planarization process
- Patent number 6,057,068
- Issue date May 2, 2000
- Advanced Micro Devices, Inc.
- Christopher H. Raeder
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Triple layer anti-reflective hard mask
- Publication number 20070093070
- Publication date Apr 26, 2007
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Non-critical complementary masking method for poly-1 definition in...
- Publication number 20060223278
- Publication date Oct 5, 2006
- Unsoon Kim
- H01 - BASIC ELECTRIC ELEMENTS

Christopher H. Raeder

Person

Patents Grantslast 30 patents

Triple layer anti-reflective hard mask

Non-critical complementary masking method for poly-1 definition in...

Polishing uniformity via pad conditioning

Method and apparatus for post-polish thickness and uniformity control

Apparatus for filling trenches

Infrared inspection for determining residual films on semiconductor...

Method and product for improved use of low k dielectric material am...

Rotary chemical-mechanical polishing apparatus employing multiple f...

Polishing pad having open area which varies with distance from init...

Method for filling trenches

Method and apparatus for controlling within-wafer uniformity in che...

System and method for controlling a multi-arm polishing tool

System and method for independent air bearing zoning for semiconduc...

Polishing pad having a wear level indicator and system using the same

Method for determining the efficiency of a planarization process

Patents Applicationslast 30 patents

Triple layer anti-reflective hard mask

Non-critical complementary masking method for poly-1 definition in...