Christopher M.S. Sears

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,894,214
- Issue date Feb 6, 2024
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods of creating multiple electron beams
- Patent number 11,651,934
- Issue date May 16, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution electron beam apparatus with dual-aperture schemes
- Patent number 11,508,591
- Issue date Nov 22, 2022
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,508,551
- Issue date Nov 22, 2022
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam system for inspection and review of 3D devices
- Patent number 11,335,608
- Issue date May 17, 2022
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field curvature correction for multi-beam inspection systems
- Patent number 11,302,511
- Issue date Apr 12, 2022
- KLA Corporation
- Alan Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Space charge insensitive electron gun designs
- Patent number 11,302,510
- Issue date Apr 12, 2022
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge control device for a system with multiple electron beams
- Patent number 11,087,950
- Issue date Aug 10, 2021
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro stigmator array for multi electron beam system
- Patent number 11,056,312
- Issue date Jul 6, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically microfocused electron emission source
- Patent number 11,037,753
- Issue date Jun 15, 2021
- KLA Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution electron energy analyzer
- Patent number 10,964,522
- Issue date Mar 30, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope objective lens calibration using X-Y v...
- Patent number 10,790,114
- Issue date Sep 29, 2020
- KLA-Tencor Corporation
- Ichiro Honjo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for edge-of-wafer inspection and review
- Patent number 10,770,258
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection array apparatus for multi-electron beam system
- Patent number 10,748,739
- Issue date Aug 18, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charge control for imaging floating metal str...
- Patent number 10,460,903
- Issue date Oct 29, 2019
- KLA-Tencor Corporation
- Arjun Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-column scanning electron microscopy system
- Patent number 10,354,832
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position feedback for multi-beam particle detector
- Patent number 10,338,013
- Issue date Jul 2, 2019
- KLA-Tencor Corporation
- Alan D. Brodie
- G01 - MEASURING TESTING
Information Patent Grant
Particle beam inspector with independently-controllable beams
- Patent number 10,276,346
- Issue date Apr 30, 2019
- KLA-Tencor Corporation
- Brian Duffy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for aberration correction in an electron beam system
- Patent number 10,224,177
- Issue date Mar 5, 2019
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus with high resolutions
- Patent number 10,096,447
- Issue date Oct 9, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for aberration correction in an electron beam system
- Patent number 10,090,131
- Issue date Oct 2, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for edge-of-wafer inspection and review
- Patent number 10,056,224
- Issue date Aug 21, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extractor electrode for electron source
- Patent number 9,934,933
- Issue date Apr 3, 2018
- KLA-Tencor Corporation
- Laurence S. Hordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for drift compensation on an electron beam based...
- Patent number 9,892,885
- Issue date Feb 13, 2018
- KLA-Tencor Corporation
- Frank Laske
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat-spreading blanking system for high throughput electron beam ap...
- Patent number 9,881,764
- Issue date Jan 30, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated SEM nanoprobe tool
- Patent number 9,805,910
- Issue date Oct 31, 2017
- KLA-Tencor Corporation
- David Trease
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for reducing charging artifacts in scanning elect...
- Patent number 9,653,257
- Issue date May 16, 2017
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for optical inspection, magnetic field and hei...
- Patent number 9,513,230
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- John Gerling
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Notched magnetic lens for improved sample access in an SEM
- Patent number 9,443,693
- Issue date Sep 13, 2016
- KLA-Tencor Corporation
- Christopher M. Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer grounding using localized plasma source
- Patent number 9,232,626
- Issue date Jan 5, 2016
- KLA-Tencor Corporation
- Christopher Sears
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMBINING FOCUSED ION BEAM MILLING AND SCANNING ELECTRON MICROSCOPE...
- Publication number 20230245933
- Publication date Aug 3, 2023
- KLA Corporation
- Youfei JIANG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Systems and Methods of Creating Multiple Electron Beams
- Publication number 20230109032
- Publication date Apr 6, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detection and Correction of System Responses in Real-Time
- Publication number 20230045072
- Publication date Feb 9, 2023
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HIGH RESOLUTION ELECTRON BEAM APPARATUS WITH DUAL-APERTURE SCHEMES
- Publication number 20220254667
- Publication date Aug 11, 2022
- KLA Corporation
- Xinrong Jiang
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE
- Publication number 20220108862
- Publication date Apr 7, 2022
- KLA Corporation
- Nikolai Chubun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM SYSTEM FOR INSPECTION AND REVIEW OF 3D DEVICES
- Publication number 20210327770
- Publication date Oct 21, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Joint Electron-Optical Columns for Flood-Charging and Image-Forming...
- Publication number 20200194223
- Publication date Jun 18, 2020
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detection and Correction of System Responses in Real-Time
- Publication number 20200194224
- Publication date Jun 18, 2020
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Deflection Array Apparatus for Multi-Electron Beam System
- Publication number 20200118784
- Publication date Apr 16, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetically Microfocused Electron Emission Source
- Publication number 20200013579
- Publication date Jan 9, 2020
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Resolution Electron Energy Analyzer
- Publication number 20190378705
- Publication date Dec 12, 2019
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Space Charge Insensitive Electron Gun Designs
- Publication number 20190371564
- Publication date Dec 5, 2019
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGE CONTROL DEVICE FOR A SYSTEM WITH MULTIPLE ELECTRON BEAMS
- Publication number 20190371566
- Publication date Dec 5, 2019
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITION FEEDBACK FOR MULTI-BEAM PARTICLE DETECTOR
- Publication number 20190227010
- Publication date Jul 25, 2019
- KLA-Tencor Corporation
- Alan D. Brodie
- G01 - MEASURING TESTING
Information Patent Application
Scanning Electron Microscope Objective Lens Calibration
- Publication number 20190004298
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Ichiro Honjo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and System for Edge-of-Wafer Inspection and Review
- Publication number 20190006143
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Column Scanning Electron Microscopy System
- Publication number 20180358200
- Publication date Dec 13, 2018
- KLA-Tencor Corporation
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Aberration Correction in an Electron Beam System
- Publication number 20180158644
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Charge Control for Imaging Floating Metal Str...
- Publication number 20170287675
- Publication date Oct 5, 2017
- KLA-Tencor Corporation
- Arjun Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Drift Compensation on an Electron Beam Based...
- Publication number 20170278666
- Publication date Sep 28, 2017
- KLA-Tencor Corporation
- Frank Laske
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Field Curvature Correction for Multi-Beam Inspection Systems
- Publication number 20170229279
- Publication date Aug 10, 2017
- KLA-Tencor Corporation
- Alan Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT-SPREADING BLANKING SYSTEM FOR HIGH THROUGHPUT ELECTRON BEAM AP...
- Publication number 20170200581
- Publication date Jul 13, 2017
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Edge-of-Wafer Inspection and Review
- Publication number 20170047193
- Publication date Feb 16, 2017
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Aberration Correction in an Electron Beam System
- Publication number 20160329189
- Publication date Nov 10, 2016
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Reducing Charging Artifacts in Scanning Elect...
- Publication number 20160260576
- Publication date Sep 8, 2016
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOTCHED MAGNETIC LENS FOR IMPROVED SAMPLE ACCESS IN AN SEM
- Publication number 20150279610
- Publication date Oct 1, 2015
- KLA-Tencor Corporation
- Christopher M. Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Asymmetric Electrostatic Quadrupole Deflector for Improved Field Un...
- Publication number 20150144785
- Publication date May 28, 2015
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Grounding Using Localized Plasma Source
- Publication number 20150123542
- Publication date May 7, 2015
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOTCHED MAGNETIC LENS FOR IMPROVED SAMPLE ACCESS IN AN SEM
- Publication number 20150083926
- Publication date Mar 26, 2015
- KLA-Tencor Corporation
- Christopher M. Sears
- H01 - BASIC ELECTRIC ELEMENTS

Christopher M.S. Sears

Person

Patents Grantslast 30 patents

Detection and correction of system responses in real-time

Systems and methods of creating multiple electron beams

High resolution electron beam apparatus with dual-aperture schemes

Detection and correction of system responses in real-time

Electron beam system for inspection and review of 3D devices

Field curvature correction for multi-beam inspection systems

Space charge insensitive electron gun designs

Charge control device for a system with multiple electron beams

Micro stigmator array for multi electron beam system

Magnetically microfocused electron emission source

High resolution electron energy analyzer

Scanning electron microscope objective lens calibration using X-Y v...

Method and system for edge-of-wafer inspection and review

Deflection array apparatus for multi-electron beam system

Method and system for charge control for imaging floating metal str...

Multi-column scanning electron microscopy system

Position feedback for multi-beam particle detector

Particle beam inspector with independently-controllable beams

Method and system for aberration correction in an electron beam system

Electron beam apparatus with high resolutions

Method and system for aberration correction in an electron beam system

Method and system for edge-of-wafer inspection and review

Extractor electrode for electron source

System and method for drift compensation on an electron beam based...

Heat-spreading blanking system for high throughput electron beam ap...

Automated SEM nanoprobe tool

Method and system for reducing charging artifacts in scanning elect...

Apparatus and method for optical inspection, magnetic field and hei...

Notched magnetic lens for improved sample access in an SEM

Wafer grounding using localized plasma source

Patents Applicationslast 30 patents

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS

COMBINING FOCUSED ION BEAM MILLING AND SCANNING ELECTRON MICROSCOPE...

Systems and Methods of Creating Multiple Electron Beams

Detection and Correction of System Responses in Real-Time

HIGH RESOLUTION ELECTRON BEAM APPARATUS WITH DUAL-APERTURE SCHEMES

ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE

ELECTRON BEAM SYSTEM FOR INSPECTION AND REVIEW OF 3D DEVICES

Joint Electron-Optical Columns for Flood-Charging and Image-Forming...

Detection and Correction of System Responses in Real-Time

Deflection Array Apparatus for Multi-Electron Beam System

Magnetically Microfocused Electron Emission Source

High Resolution Electron Energy Analyzer

Space Charge Insensitive Electron Gun Designs

CHARGE CONTROL DEVICE FOR A SYSTEM WITH MULTIPLE ELECTRON BEAMS

POSITION FEEDBACK FOR MULTI-BEAM PARTICLE DETECTOR

Scanning Electron Microscope Objective Lens Calibration

Method and System for Edge-of-Wafer Inspection and Review

Multi-Column Scanning Electron Microscopy System

Method and System for Aberration Correction in an Electron Beam System

Method and System for Charge Control for Imaging Floating Metal Str...

System and Method for Drift Compensation on an Electron Beam Based...

Field Curvature Correction for Multi-Beam Inspection Systems

HEAT-SPREADING BLANKING SYSTEM FOR HIGH THROUGHPUT ELECTRON BEAM AP...

Method and System for Edge-of-Wafer Inspection and Review

Method and System for Aberration Correction in an Electron Beam System

Method and System for Reducing Charging Artifacts in Scanning Elect...

NOTCHED MAGNETIC LENS FOR IMPROVED SAMPLE ACCESS IN AN SEM

Asymmetric Electrostatic Quadrupole Deflector for Improved Field Un...

Wafer Grounding Using Localized Plasma Source

NOTCHED MAGNETIC LENS FOR IMPROVED SAMPLE ACCESS IN AN SEM