Christopher Neville

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of aligning deposited nanotubes onto an etched feature using...
- Patent number 7,858,979
- Issue date Dec 28, 2010
- Nantero, Inc.
- Colin D. Yates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of aligning deposited nanotubes onto an etched feature using...
- Patent number 7,541,216
- Issue date Jun 2, 2009
- Nantero, Inc.
- Colin D. Yates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window compliant corrections of design layout
- Patent number 7,313,508
- Issue date Dec 25, 2007
- LSI Corporation
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple alternating phase shift technology for amplifying resolution
- Patent number 7,001,695
- Issue date Feb 21, 2006
- LSI Logic Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis pupil aperture and method for making the same
- Patent number 6,426,131
- Issue date Jul 30, 2002
- LSI Logic Corporation
- Philip Eric Jackson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using a test reticle to optimize alignment of integrated...
- Patent number 5,898,478
- Issue date Apr 27, 1999
- LSI Logic Corporation
- Randy Yim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuit test reticle and alignment mark optimization method
- Patent number 5,627,624
- Issue date May 6, 1997
- LSI Logic Corporation
- Randy Yim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuit test reticle and alignment mark optimization method
- Patent number 5,329,334
- Issue date Jul 12, 1994
- LSI Logic Corporation
- Randy Yim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ALIGNING DEPOSITED NANOTUBES ONTO AN ETCHED FEATURE USING...
- Publication number 20090243102
- Publication date Oct 1, 2009
- Nantero, Inc.
- Colin D. Yates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of aligning deposited nanotubes onto an etched feature using...
- Publication number 20060281287
- Publication date Dec 14, 2006
- Colin D. Yates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process and apparatus for applying apodization to maskless optical...
- Publication number 20050151949
- Publication date Jul 14, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple alternating phase shift technology for amplifying resolution
- Publication number 20040224239
- Publication date Nov 11, 2004
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process window compliant corrections of design layout
- Publication number 20040128118
- Publication date Jul 1, 2004
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christopher Neville

Person

Patents Grantslast 30 patents

Method of aligning deposited nanotubes onto an etched feature using...

Method of aligning deposited nanotubes onto an etched feature using...

Process window compliant corrections of design layout

Multiple alternating phase shift technology for amplifying resolution

Off-axis pupil aperture and method for making the same

Method of using a test reticle to optimize alignment of integrated...

Integrated circuit test reticle and alignment mark optimization method

Integrated circuit test reticle and alignment mark optimization method

Patents Applicationslast 30 patents

METHOD OF ALIGNING DEPOSITED NANOTUBES ONTO AN ETCHED FEATURE USING...

Method of aligning deposited nanotubes onto an etched feature using...

Process and apparatus for applying apodization to maskless optical...

Multiple alternating phase shift technology for amplifying resolution

Process window compliant corrections of design layout