Christopher Talone

Person

Slingerlands, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for gate stack formation and etching
- Patent number 12,009,430
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-containing liner process
- Patent number 11,699,741
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes
- Patent number 11,398,386
- Issue date Jul 26, 2022
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selective etching at an interface between materials
- Patent number 11,133,194
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to protect nitride layers during formation of silicon germa...
- Patent number 10,903,077
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of surface restoration for nitride etching
- Patent number 10,811,273
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of silicon-containing organic film using s...
- Patent number 10,529,589
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Erdinc Karakas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced methods for plasma systems operation
- Patent number 10,529,540
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in situ hard mask removal
- Patent number 10,490,404
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning intersecting structures
- Patent number 10,204,832
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Metal-Containing Liner Process
- Publication number 20220384607
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GATE STACK FORMATION AND ETCHING
- Publication number 20200273992
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH PROCESSES
- Publication number 20200273711
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Selective Etching at an Interface Between Materials
- Publication number 20200266070
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO PROTECT NITRIDE LAYERS DURING FORMATION OF SILICON GERMA...
- Publication number 20200027736
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED METHODS FOR PLASMA SYSTEMS OPERATION
- Publication number 20190304750
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Surface Restoration for Nitride Etching
- Publication number 20190080926
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA ETCHING OF SILICON-CONTAINING ORGANIC FILM USING S...
- Publication number 20180358233
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Erdinc Karakas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING INTERSECTING STRUCTURES
- Publication number 20180082903
- Publication date Mar 22, 2018
- TOKYO ELECTRON LIMITED
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN SITU HARD MASK REMOVAL
- Publication number 20180082842
- Publication date Mar 22, 2018
- TOKYO ELECTRON LIMITED
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS

Christopher Talone

Person

Patents Grantslast 30 patents

Method for gate stack formation and etching

Metal-containing liner process

Plasma etch processes

Method for selective etching at an interface between materials

Methods to protect nitride layers during formation of silicon germa...

Methods of surface restoration for nitride etching

Method of plasma etching of silicon-containing organic film using s...

Advanced methods for plasma systems operation

Method of in situ hard mask removal

Method of patterning intersecting structures

Patents Applicationslast 30 patents

Metal-Containing Liner Process

METHOD FOR GATE STACK FORMATION AND ETCHING

PLASMA ETCH PROCESSES

Method for Selective Etching at an Interface Between Materials

METHODS TO PROTECT NITRIDE LAYERS DURING FORMATION OF SILICON GERMA...

ADVANCED METHODS FOR PLASMA SYSTEMS OPERATION

Methods of Surface Restoration for Nitride Etching

METHOD OF PLASMA ETCHING OF SILICON-CONTAINING ORGANIC FILM USING S...

METHOD OF PATTERNING INTERSECTING STRUCTURES

METHOD OF IN SITU HARD MASK REMOVAL