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Patents Grants
last 30 patents
Information
Patent Grant
Method of forming a high K metallic dielectric layer
Patent number
6,764,914
Issue date
Jul 20, 2004
Chartered Semiconductor Manufacturing Ltd.
Alex See
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming of high K metallic dielectric layer
Patent number
6,492,242
Issue date
Dec 10, 2002
Chartered Semiconductor Manufacturing Ltd.
Alex See
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method to fabricate RF inductors with minimum area
Patent number
6,387,747
Issue date
May 14, 2002
Chartered Semiconductor Manufacturing Ltd.
Randall Cha
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method to eliminate top metal corner shaping during bottom metal pa...
Patent number
6,284,590
Issue date
Sep 4, 2001
Chartered Semiconductor Manufacturing Ltd.
Randall Cher Liang Cha
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Method of forming a high K metallic dielectric layer
Publication number
20030104673
Publication date
Jun 5, 2003
Chartered Semiconductor Manufacturing Ltd.
Alex See
H01 - BASIC ELECTRIC ELEMENTS