Chuan He

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for uniformly metallization on substrates
- Patent number 9,666,426
- Issue date May 30, 2017
- ACM Research (Shanghai) Inc.
- Hui Wang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 9,281,177
- Issue date Mar 8, 2016
- ACM Research (Shanghai) Inc.
- Hui Wang
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 9,070,723
- Issue date Jun 30, 2015
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 8,671,961
- Issue date Mar 18, 2014
- ACM Research (Shanghai) Inc.
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 8,580,042
- Issue date Nov 12, 2013
- ACM Research (Shanghai) Inc.
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for thermal treatment of semiconductor workpieces
- Patent number 8,383,429
- Issue date Feb 26, 2013
- ACM Research (Shanghai) Inc.
- Yue Ma
- F27 - FURNACES KILNS OVENS RETORTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES
- Publication number 20170327965
- Publication date Nov 16, 2017
- ACM Research (Shanghai) Inc.
- Hui Wang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Methods and Apparatus for Cleaning Semiconductor Wafers
- Publication number 20150294856
- Publication date Oct 15, 2015
- ACM Research (Shanghai) Inc.
- Hui Wang
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES
- Publication number 20140216940
- Publication date Aug 7, 2014
- ACM Research (Shanghai) Inc.
- Hui Wang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Methods and Apparatus for Cleaning Semiconductor Wafers
- Publication number 20140034094
- Publication date Feb 6, 2014
- ACM Research (Shanghai) Inc.
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SUBSTANTIALLY UNIFORM COPPER DEPOSITION ONTO SEMICONDUCT...
- Publication number 20110259752
- Publication date Oct 27, 2011
- ACM Research (Shanghai) Inc.
- Yue Ma
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20110114120
- Publication date May 19, 2011
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLUTION PREPARATION APPARATUS AND METHOD FOR TREATING INDIVIDUAL S...
- Publication number 20110079247
- Publication date Apr 7, 2011
- Yue Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCHEMICAL DEPOSITION SYSTEM
- Publication number 20110073469
- Publication date Mar 31, 2011
- Yue Ma
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND APPARATUS FOR THERMAL TREATMENT OF SEMICONDUCTOR WORKPIECES
- Publication number 20100240226
- Publication date Sep 23, 2010
- Yue Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20100139710
- Publication date Jun 10, 2010
- Hui Wang
- B08 - CLEANING

Person

Patents Grantslast 30 patents

Methods and apparatus for uniformly metallization on substrates

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Method and apparatus for thermal treatment of semiconductor workpieces

Patents Applicationslast 30 patents

METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES

Methods and Apparatus for Cleaning Semiconductor Wafers

METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES

Methods and Apparatus for Cleaning Semiconductor Wafers

METHOD FOR SUBSTANTIALLY UNIFORM COPPER DEPOSITION ONTO SEMICONDUCT...

METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS

SOLUTION PREPARATION APPARATUS AND METHOD FOR TREATING INDIVIDUAL S...

ELECTROCHEMICAL DEPOSITION SYSTEM

METHOD AND APPARATUS FOR THERMAL TREATMENT OF SEMICONDUCTOR WORKPIECES

METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS