Chuan Peng

Person

Hangzhou, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Laterally diffused metal oxide semiconductor structure and method f...
- Patent number 11,830,932
- Issue date Nov 28, 2023
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laterally diffused metal oxide semiconductor device and method for...
- Patent number 11,742,206
- Issue date Aug 29, 2023
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laterally diffused metal oxide semiconductor device and method for...
- Patent number 11,710,787
- Issue date Jul 25, 2023
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing laterally diffused metal oxide semiconduct...
- Patent number 11,329,153
- Issue date May 10, 2022
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacture method thereof
- Patent number 11,251,130
- Issue date Feb 15, 2022
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Chuan Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laterally diffused metal oxide semiconductor device and method for...
- Patent number 11,121,251
- Issue date Sep 14, 2021
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laterally diffused metal oxide semiconductor device and method for...
- Patent number 10,998,416
- Issue date May 4, 2021
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laterally diffused metal oxide semiconductor structure and method f...
- Patent number 10,903,340
- Issue date Jan 26, 2021
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing CMOS structure
- Patent number 10,438,854
- Issue date Oct 8, 2019
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing CMOS structure
- Patent number 10,332,804
- Issue date Jun 25, 2019
- Silergy Semiconductor Technology (Hangzhou) Ltd.
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH-VOLTAGE CAPACITOR, MANUFACTURING METHOD THEREOF AND INTEGRATED...
- Publication number 20250089278
- Publication date Mar 13, 2025
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Zheng LV
Information Patent Application
HIGH-VOLTAGE CAPACITOR AND METHOD FOR MANUFACTURING SAME, AND INTEG...
- Publication number 20250089279
- Publication date Mar 13, 2025
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Zheng LV
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURE METHOD THEREOF
- Publication number 20220130762
- Publication date Apr 28, 2022
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Chuan Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...
- Publication number 20210376144
- Publication date Dec 2, 2021
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...
- Publication number 20210193815
- Publication date Jun 24, 2021
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR STRUCTURE AND METHOD F...
- Publication number 20210143266
- Publication date May 13, 2021
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...
- Publication number 20190363188
- Publication date Nov 28, 2019
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...
- Publication number 20190363185
- Publication date Nov 28, 2019
- Silergy Semiconductor Technology (Hangzhou) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR STRUCTURE AND METHOD F...
- Publication number 20190363186
- Publication date Nov 28, 2019
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Laterally Diffused Metal Oxide Semiconduct...
- Publication number 20190363187
- Publication date Nov 28, 2019
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong YOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CMOS STRUCTURE
- Publication number 20180277447
- Publication date Sep 27, 2018
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURE METHOD THEREOF
- Publication number 20170018430
- Publication date Jan 19, 2017
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Chuan Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CMOS STRUCTURE
- Publication number 20160043004
- Publication date Feb 11, 2016
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CMOS STRUCTURE
- Publication number 20160043005
- Publication date Feb 11, 2016
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Budong You
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Laterally diffused metal oxide semiconductor structure and method f...

Laterally diffused metal oxide semiconductor device and method for...

Laterally diffused metal oxide semiconductor device and method for...

Method for manufacturing laterally diffused metal oxide semiconduct...

Semiconductor structure and manufacture method thereof

Laterally diffused metal oxide semiconductor device and method for...

Laterally diffused metal oxide semiconductor device and method for...

Laterally diffused metal oxide semiconductor structure and method f...

Method for manufacturing CMOS structure

Method for manufacturing CMOS structure

Patents Applicationslast 30 patents

HIGH-VOLTAGE CAPACITOR, MANUFACTURING METHOD THEREOF AND INTEGRATED...

HIGH-VOLTAGE CAPACITOR AND METHOD FOR MANUFACTURING SAME, AND INTEG...

SEMICONDUCTOR STRUCTURE AND MANUFACTURE METHOD THEREOF

LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...

LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...

LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR STRUCTURE AND METHOD F...

LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...

LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE AND METHOD FOR...

LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR STRUCTURE AND METHOD F...

Method for Manufacturing Laterally Diffused Metal Oxide Semiconduct...

METHOD FOR MANUFACTURING CMOS STRUCTURE

SEMICONDUCTOR STRUCTURE AND MANUFACTURE METHOD THEREOF

METHOD FOR MANUFACTURING CMOS STRUCTURE

METHOD FOR MANUFACTURING CMOS STRUCTURE