Chuanwen Lin

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Joetsu-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 11,846,884
- Issue date Dec 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,835,859
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,519,213
- Issue date Dec 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,164,384
- Issue date Oct 20, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20220066319
- Publication date Mar 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220004101
- Publication date Jan 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220004100
- Publication date Jan 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140322650
- Publication date Oct 30, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140255843
- Publication date Sep 11, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY