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Method to determine process window
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Patent number 8,225,237
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Issue date Jul 17, 2012
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United Microelectronics Corp.
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Te-Hung Wu
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method for constructing OPC model
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Patent number 8,166,424
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Issue date Apr 24, 2012
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United Microelectronics Corp.
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Te-Hung Wu
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Lithography method
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Patent number 7,312,020
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Issue date Dec 25, 2007
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United Microelectronics Corp.
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Chin-Lung Lin
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Phase shift mask
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Patent number 7,141,337
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Issue date Nov 28, 2006
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United Microelectronics Corp.
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Chin-Lung Lin
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photomask pattern
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Patent number 7,008,732
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Issue date Mar 7, 2006
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United Microelectronics Corp.
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Chin-Lung Lin
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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