Chunchieh Huang

Person

Orlando, FL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming ONO-type sidewall with reduced bird's beak
- Patent number 7,910,429
- Issue date Mar 22, 2011
- Promos Technologies, Inc.
- Zhong Dong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate isolation in integrated circuits
- Patent number 7,387,942
- Issue date Jun 17, 2008
- ProMOS Technologies Inc.
- Daniel Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate isolation in integrated circuits
- Patent number 7,358,149
- Issue date Apr 15, 2008
- Promos Technologies, Inc.
- Daniel Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of pedestals to fabricate contact openings
- Patent number 7,300,745
- Issue date Nov 27, 2007
- ProMOS Technologies Inc.
- Chia-Shun Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precision creation of inter-gates insulator
- Patent number 7,229,880
- Issue date Jun 12, 2007
- ProMOS Technologies Inc.
- Zhong Dong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of multiple etching steps to reduce lateral etch undercut
- Patent number 7,071,115
- Issue date Jul 4, 2006
- ProMOS Technologies Inc.
- Chunchieh Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bipolar transistor with a low K material in emitter base spacer reg...
- Patent number 6,657,281
- Issue date Dec 2, 2003
- Agere Systems Inc.
- Yih-Feng Chyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall protection in fabrication of integrated circuits
- Patent number 6,566,196
- Issue date May 20, 2003
- Mosel Vitelic, Inc.
- Barbara Haselden
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Precision creation of inter-gates insulator
- Publication number 20070264776
- Publication date Nov 15, 2007
- Zhong Dong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of multiple etching steps to reduce lateral etch undercut
- Publication number 20060211255
- Publication date Sep 21, 2006
- Chunchieh Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate isolation in integrated circuits
- Publication number 20050266628
- Publication date Dec 1, 2005
- Daniel Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming ONO-type sidewall with reduced bird's beak
- Publication number 20050227437
- Publication date Oct 13, 2005
- ProMos Technologies Inc.
- Zhong Dong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of pedestals to fabricate contact openings
- Publication number 20050170578
- Publication date Aug 4, 2005
- Chia-Shun Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of multiple etching steps to reduce lateral etch undercut
- Publication number 20050170646
- Publication date Aug 4, 2005
- Chunchieh Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate isolation in integrated circuits
- Publication number 20050124102
- Publication date Jun 9, 2005
- Daniel Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Precision creation of inter-gates insulator
- Publication number 20050106793
- Publication date May 19, 2005
- Mosel Vitelic, Inc.
- Zhong Dong
- H01 - BASIC ELECTRIC ELEMENTS

Chunchieh Huang

Person

Patents Grantslast 30 patents

Method of forming ONO-type sidewall with reduced bird's beak

Substrate isolation in integrated circuits

Substrate isolation in integrated circuits

Use of pedestals to fabricate contact openings

Precision creation of inter-gates insulator

Use of multiple etching steps to reduce lateral etch undercut

Bipolar transistor with a low K material in emitter base spacer reg...

Sidewall protection in fabrication of integrated circuits

Patents Applicationslast 30 patents

Precision creation of inter-gates insulator

Use of multiple etching steps to reduce lateral etch undercut

Substrate isolation in integrated circuits

Method of forming ONO-type sidewall with reduced bird's beak

Use of pedestals to fabricate contact openings

Use of multiple etching steps to reduce lateral etch undercut

Substrate isolation in integrated circuits

Precision creation of inter-gates insulator