Chung-Hsun Li

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 11,977,034
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Calibration method for a lithographic system
- Patent number 11,774,861
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Cornelis Melchior Brouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining overlay
- Patent number 11,774,869
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Ruud Hendrikus Martinus Johannes Bloks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for decision making in a semiconductor manufacturing process
- Patent number 11,687,007
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Arnaud Hubaux
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,996,176
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,746,668
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,317,191
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE
- Publication number 20230341783
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS
- Publication number 20230333482
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALIBRATION METHOD FOR A LITHOGRAPHIC SYSTEM
- Publication number 20220390855
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Cornelis Melchior BROUWER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD AND SYSTEM FOR DETERMINING OVERLAY
- Publication number 20220171299
- Publication date Jun 2, 2022
- ASML NETHERLANDS B.V.
- Ruud Hendrikus Martinus Johannes BLOKS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS
- Publication number 20220082949
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G05 - CONTROLLING REGULATING
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20210215622
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G05 - CONTROLLING REGULATING
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20200319118
- Publication date Oct 8, 2020
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD OF DETERMINING PELLICLE DEGRADATION COMPENSATION CORRECTIONS...
- Publication number 20190384164
- Publication date Dec 19, 2019
- ASML NETHERLANDS B.V.
- Marcel Theodorus Maria VAN KESSEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20190301850
- Publication date Oct 3, 2019
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G01 - MEASURING TESTING

Chung-Hsun Li

Person

Patents Grantslast 30 patents

Methods and apparatus for measuring a property of a substrate

Calibration method for a lithographic system

Method and system for determining overlay

Method for decision making in a semiconductor manufacturing process

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for measuring a property of a substrate

Patents Applicationslast 30 patents

DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE

METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS

CALIBRATION METHOD FOR A LITHOGRAPHIC SYSTEM

A METHOD AND SYSTEM FOR DETERMINING OVERLAY

METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS

Methods and Apparatus for Measuring a Property of a Substrate

Methods and Apparatus for Measuring a Property of a Substrate

METHOD OF DETERMINING PELLICLE DEGRADATION COMPENSATION CORRECTIONS...

Methods and Apparatus for Measuring a Property of a Substrate