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Whitehouse Station, NJ, US
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Patents Grants
last 30 patents
Information
Patent Grant
DNQ-type photoresist composition including alkali-soluble acrylic r...
Patent number
11,822,242
Issue date
Nov 21, 2023
Merck Patent GmbH
Weihong Liu
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Negative-working ultra thick film photoresist
Patent number
11,698,586
Issue date
Jul 11, 2023
Merck Patent GmbH
Aritaka Hishida
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive working photosensitive material
Patent number
10,976,662
Issue date
Apr 13, 2021
Merck Patent GmbH
Weihong Liu
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Negative-working photoresist compositions for laser ablation and us...
Patent number
10,705,424
Issue date
Jul 7, 2020
Merck Patent GmbH
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photosensitive material
Patent number
9,012,126
Issue date
Apr 21, 2015
AZ Electronic Materials (Luxembourg) S.A.R.L.
Weihong Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative-working thick film photoresist
Patent number
8,906,594
Issue date
Dec 9, 2014
AZ Electronic Materials (Luxembourg) S.A.R.L.
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative photoresist compositions
Patent number
7,601,482
Issue date
Oct 13, 2009
AZ Electronic Materials USA Corp.
Georg Pawlowski
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Nanocomposite photoresist composition for imaging thick films
Patent number
7,524,606
Issue date
Apr 28, 2009
AZ Electronic Materials USA Corp.
Chunwei Chen
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Nanocomposite photosensitive composition and use thereof
Patent number
7,247,419
Issue date
Jul 24, 2007
AZ Electronic Materials USA Corp.
Chunwei Chen
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROF...
Publication number
20240045333
Publication date
Feb 8, 2024
Merck Patent GmbH
Hung-Yang CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DNQ-FREE CHEMICALLY AMPLIFIED RESIST COMPOSITION
Publication number
20230112024
Publication date
Apr 13, 2023
Merck Patent GmbH
Weihong LIU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...
Publication number
20220357658
Publication date
Nov 10, 2022
Merck Patent GmbH
Weihong LIU
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
LITHOGRAPHICALLY DEFINED ELECTRICAL INTERCONNECTS FROM CONDUCTIVE P...
Publication number
20220336341
Publication date
Oct 20, 2022
ORMET CIRCUITS, INC.
Catherine A. SHEARER
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
Publication number
20220019141
Publication date
Jan 20, 2022
Merck Patent GmbH
Weihong LIU
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
Publication number
20200393758
Publication date
Dec 17, 2020
Merck Patent GmbH
Aritaka HISHIDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
Publication number
20190064662
Publication date
Feb 28, 2019
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
Weihong LIU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...
Publication number
20170285475
Publication date
Oct 5, 2017
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...
Publication number
20170176856
Publication date
Jun 22, 2017
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE PHOTOSENSITIVE MATERIAL
Publication number
20130337380
Publication date
Dec 19, 2013
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Weihong LIU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE-WORKING THICK FILM PHOTORESIST
Publication number
20130337381
Publication date
Dec 19, 2013
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Chunwei CHEN
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
Publication number
20130108956
Publication date
May 2, 2013
AZ Electronic Materials USA Corp.
Ping-Hung LU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
Publication number
20130105440
Publication date
May 2, 2013
AZ Electronic Materials USA Corp.
Ping-Hung LU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative photoresist compositions
Publication number
20070231735
Publication date
Oct 4, 2007
Georg Pawlowski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
Publication number
20070141510
Publication date
Jun 21, 2007
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Nanocomposite photoresist composition for imaging thick films
Publication number
20060228644
Publication date
Oct 12, 2006
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Nanocomposite photosensitive composition and use thereof
Publication number
20060228645
Publication date
Oct 12, 2006
Chunwei Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY