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Chunyi Wu

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  • Shrewsbury, MA, US
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
    • Publication number 20220043342
    • Publication date Feb 10, 2022
    • Rohm and Haas Electronic Materials L.L.C.
    • Thomas Cardolaccia
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    POLYMERS AND PHOTORESIST COMPOSITIONS
    • Publication number 20210200084
    • Publication date Jul 1, 2021
    • Rohm and Haas Electronic Materials L.L.C.
    • Jong Keun Park
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
    • Publication number 20200004152
    • Publication date Jan 2, 2020
    • Rohm and Haas Electronic Materials L.L.C.
    • Irvinder KAUR
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
    • Publication number 20190203065
    • Publication date Jul 4, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Irvinder Kaur
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
    • Publication number 20190204741
    • Publication date Jul 4, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Joshua A. Kaitz
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PATTERN TREATMENT METHODS
    • Publication number 20180031975
    • Publication date Feb 1, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Jin Wuk Sung
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOT...
    • Publication number 20160070172
    • Publication date Mar 10, 2016
    • Rohm and Haas Electronic Materials, L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND
    • Publication number 20150353482
    • Publication date Dec 10, 2015
    • Rohm and Haas Electronic Materials L.L.C.
    • Cong Liu
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS
    • Publication number 20150323869
    • Publication date Nov 12, 2015
    • The Dow Chemical Company
    • Cong Liu
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
    • Publication number 20140295348
    • Publication date Oct 2, 2014
    • Deyan WANG
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PHOTORESISTS COMPRISING IONIC COMPOUND
    • Publication number 20140120470
    • Publication date May 1, 2014
    • Rohm and Haas Electronic Materials L.L.C.
    • Gerhard POHLERS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    THERMAL ACID GENERATORS FOR USE IN PHOTORESIST
    • Publication number 20140120469
    • Publication date May 1, 2014
    • Rohm and Haas Electronic Materials L.L.C.
    • Gregory P. PROKOPOWICZ
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME
    • Publication number 20140065540
    • Publication date Mar 6, 2014
    • ROHM AND HAAS ELECTRONIC MATERIALS
    • Deyan Wang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTORESISTS COMPRISING AMIDE COMPONENT
    • Publication number 20130344439
    • Publication date Dec 26, 2013
    • Cong LIU
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT
    • Publication number 20130244178
    • Publication date Sep 19, 2013
    • Rohm and Haas Electronic Materials L.L.C.
    • Gregory P. Prokopowicz
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME
    • Publication number 20130137035
    • Publication date May 30, 2013
    • DOW GLOBAL TECHNOLOGIES LLC
    • Deyan Wang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
    • Publication number 20130017487
    • Publication date Jan 17, 2013
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    POLYMER COMPOSITION AND PHOTORESIST COMPRISING THE POLYMER
    • Publication number 20120301823
    • Publication date Nov 29, 2012
    • DOW GLOBAL TECHNOLOGIES LLC
    • Gregory P. Prokopowicz
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
    • Publication number 20120225384
    • Publication date Sep 6, 2012
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR P...
    • Publication number 20120171626
    • Publication date Jul 5, 2012
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan WANG
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITH...
    • Publication number 20120156595
    • Publication date Jun 21, 2012
    • Rohm and Haas Electronic Materials L.L.C.
    • Joon-Seok OH
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT
    • Publication number 20120077120
    • Publication date Mar 29, 2012
    • Rohm and Haas Electronic Materials L.L.C.
    • Gregory P. PROKOPOWICZ
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND
    • Publication number 20110223535
    • Publication date Sep 15, 2011
    • Rohm and Haas Electronic Materials L.L.C.
    • Cong Liu
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    Compositions and processes for photolithography
    • Publication number 20100304290
    • Publication date Dec 2, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions comprising sulfonamide material and processes for phot...
    • Publication number 20100297550
    • Publication date Nov 25, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions and processes for photolithography
    • Publication number 20100183977
    • Publication date Jul 22, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Compositions and processes for photolithography
    • Publication number 20100183976
    • Publication date Jul 22, 2010
    • Rohm and Haas Electronics Materials LLC
    • Deyan Wang
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    Leveler compounds
    • Publication number 20090139873
    • Publication date Jun 4, 2009
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Plating method
    • Publication number 20070012576
    • Publication date Jan 18, 2007
    • Rohm and Haas Electronic Materials L.L.C.
    • Robert A. Binstead
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Leveler compounds
    • Publication number 20060016693
    • Publication date Jan 26, 2006
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR