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Claudia PILIEGO

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  • Eindhoven, NL
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Patents Grantslast 30 patents

  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 11,762,281
    • Issue date Sep 19, 2023
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 10,908,496
    • Issue date Feb 2, 2021
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20240004283
    • Publication date Jan 4, 2024
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20210109438
    • Publication date Apr 15, 2021
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    A MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20190129299
    • Publication date May 2, 2019
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich NASALEVICH
    • G02 - OPTICS