Cong Liu

Person

Shrewsbury, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,085,854
- Issue date Sep 10, 2024
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 11,940,731
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topcoat compositions and photolithographic methods
- Patent number 11,846,885
- Issue date Dec 19, 2023
- Rohm and Haas Electronic Materials, LLC
- Cong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,809,077
- Issue date Nov 7, 2023
- Rohm and Haas Electronic Materials LLC
- Thomas Cardolaccia
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,796,916
- Issue date Oct 24, 2023
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist pattern trimming compositions and pattern formation met...
- Patent number 11,506,981
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 11,106,137
- Issue date Aug 31, 2021
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,003,074
- Issue date May 11, 2021
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresists comprising amide component
- Patent number 10,719,014
- Issue date Jul 21, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-formation methods
- Patent number 10,684,549
- Issue date Jun 16, 2020
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and photoresist compositions
- Patent number 10,670,965
- Issue date Jun 2, 2020
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,578,969
- Issue date Mar 3, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresists comprising carbamate component
- Patent number 10,539,870
- Issue date Jan 21, 2020
- Rohm and Haas Electronic Materials LLC
- William Williams
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresists comprising ionic compound
- Patent number 10,527,934
- Issue date Jan 7, 2020
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,481,495
- Issue date Nov 19, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonyl photoacid generators and photoresists comprising same
- Patent number 10,466,588
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,241,407
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,241,411
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Acid generator compounds and photoresists comprising same
- Patent number 10,221,131
- Issue date Mar 5, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,197,918
- Issue date Feb 5, 2019
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Topcoat compositions and pattern-forming methods
- Patent number 10,042,259
- Issue date Aug 7, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,007,179
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating compound, polymer derived therefrom, photoresi...
- Patent number 9,921,475
- Issue date Mar 20, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern trimming methods
- Patent number 9,869,933
- Issue date Jan 16, 2018
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern trimming compositions and methods
- Patent number 9,760,011
- Issue date Sep 12, 2017
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple-pattern forming methods
- Patent number 9,753,370
- Issue date Sep 5, 2017
- Dow Global Technologies LLC
- Chang-Young Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lactone photoacid generators and resins and photoresists comprising...
- Patent number 9,720,321
- Issue date Aug 1, 2017
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist pattern trimming compositions and methods
- Patent number 9,696,629
- Issue date Jul 4, 2017
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METALLIZATION METHOD
- Publication number 20240055382
- Publication date Feb 15, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Mitsuru Haga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230251575
- Publication date Aug 10, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230104130
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING P...
- Publication number 20220128906
- Publication date Apr 28, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220043342
- Publication date Feb 10, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Thomas Cardolaccia
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...
- Publication number 20210232047
- Publication date Jul 29, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMATION METHODS
- Publication number 20210200081
- Publication date Jul 1, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Cheng-Bai XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...
- Publication number 20200379351
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20200004152
- Publication date Jan 2, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder KAUR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20190243246
- Publication date Aug 8, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190235385
- Publication date Aug 1, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190203065
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190204741
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua A. Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS
- Publication number 20190204743
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHODS
- Publication number 20190204742
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Choong-Bong LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...
- Publication number 20180314155
- Publication date Nov 1, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMATION METHODS
- Publication number 20180188654
- Publication date Jul 5, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS
- Publication number 20180118970
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20180118968
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20180120703
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESI...
- Publication number 20180059542
- Publication date Mar 1, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN TRIMMING COMPOSITIONS AND METHODS
- Publication number 20170255102
- Publication date Sep 7, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN TRIMMING METHODS
- Publication number 20170255103
- Publication date Sep 7, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SULFONYL PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20170153542
- Publication date Jun 1, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...
- Publication number 20170123313
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...
- Publication number 20170123314
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160347709
- Publication date Dec 1, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20160333212
- Publication date Nov 17, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS
- Publication number 20160187783
- Publication date Jun 30, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS
- Publication number 20160130462
- Publication date May 12, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Cong LIU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Pattern formation methods

Photoresist compositions and pattern formation methods

Photoresist topcoat compositions and methods of processing photores...

Topcoat compositions and photolithographic methods

Photoresist compositions and methods

Photoresist compositions and pattern formation methods

Pattern formation methods and photoresist pattern overcoat composit...

Photoresist pattern trimming compositions and pattern formation met...

Compositions comprising base-reactive component and processes for p...

Pattern formation methods and photoresist pattern overcoat composit...

Photoresists comprising amide component

Pattern-formation methods

Polymers and photoresist compositions

Photoresist topcoat compositions and methods of processing photores...

Photoresists comprising carbamate component

Photoresists comprising ionic compound

Topcoat compositions containing fluorinated thermal acid generators

Sulfonyl photoacid generators and photoresists comprising same

Thermal acid generators and photoresist pattern trimming compositio...

Topcoat compositions containing fluorinated thermal acid generators

Acid generator compounds and photoresists comprising same

Photoresist topcoat compositions and methods of processing photores...

Topcoat compositions and pattern-forming methods

Thermal acid generators and photoresist pattern trimming compositio...

Photoacid-generating compound, polymer derived therefrom, photoresi...

Pattern trimming methods

Pattern trimming compositions and methods

Multiple-pattern forming methods

Lactone photoacid generators and resins and photoresists comprising...

Photoresist pattern trimming compositions and methods

Patents Applicationslast 30 patents

METALLIZATION METHOD

PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING P...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...

PATTERN FORMATION METHODS

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST COMPOSITIONS AND METHODS

PATTERN FORMATION METHODS

PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...

PATTERN-FORMATION METHODS

TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESI...

PATTERN TRIMMING COMPOSITIONS AND METHODS

PATTERN TRIMMING METHODS

SULFONYL PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...

ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS

TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS