Cozy Ban

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
High-temperature ultrapure water production apparatus and liquid me...
- Patent number 6,562,205
- Issue date May 13, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method for treating semiconductor substrates
- Patent number 6,431,183
- Issue date Aug 13, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method and apparatus for removing contaminants from the surface of...
- Patent number 6,410,454
- Issue date Jun 25, 2002
- Mitsubishi Denki Kabushiki
- Seiji Muranaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor workpiece cleaning method and apparatus
- Patent number 6,227,212
- Issue date May 8, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- B08 - CLEANING
Information Patent Grant
Method of forming tungsten silicide film, method of fabricating sem...
- Patent number 6,221,771
- Issue date Apr 24, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor workpiece cleaning method and apparatus
- Patent number 6,145,519
- Issue date Nov 14, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- B08 - CLEANING
Information Patent Grant
Semiconductor manufacturing non-processing apparatuses with storage...
- Patent number 6,131,052
- Issue date Oct 10, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying apparatus and method using IPA of a semiconductor wafer
- Patent number 6,032,382
- Issue date Mar 7, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Akinori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor nitride film etching system
- Patent number 6,001,215
- Issue date Dec 14, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying apparatus and method
- Patent number 5,996,242
- Issue date Dec 7, 1999
- Ryoden Semiconductor System Engineering Corporation
- Akinori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying apparatus for processing surface of substrate
- Patent number 5,956,859
- Issue date Sep 28, 1999
- Ryoden Semiconductor System Emgineering Corporation
- Akinori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing pure water
- Patent number 5,554,295
- Issue date Sep 10, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Apparatus for producing pure water
- Patent number 5,470,461
- Issue date Nov 28, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Apparatus for manufacturing ultrapure water
- Patent number 5,468,350
- Issue date Nov 21, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Aeration apparatus for producing ultrapure water
- Patent number 5,380,471
- Issue date Jan 10, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Wet-process apparatus
- Patent number 5,344,615
- Issue date Sep 6, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Motonori Yanagi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Apparatus for treating the surface of a semiconductor substrate
- Patent number 5,336,356
- Issue date Aug 9, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for producing ultrapure water and method of co...
- Patent number 5,246,586
- Issue date Sep 21, 1993
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- G05 - CONTROLLING REGULATING
Information Patent Grant
Device for and method of producing hyperfine frozen particles
- Patent number 5,216,890
- Issue date Jun 8, 1993
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...

Patents Applicationslast 30 patents

Information Patent Application
Plating apparatus and plating method, and method of manufacturing s...
- Publication number 20030006135
- Publication date Jan 9, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Cozy Ban
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Person

Patents Grantslast 30 patents

High-temperature ultrapure water production apparatus and liquid me...

Method for treating semiconductor substrates

Method and apparatus for removing contaminants from the surface of...

Semiconductor workpiece cleaning method and apparatus

Method of forming tungsten silicide film, method of fabricating sem...

Semiconductor workpiece cleaning method and apparatus

Semiconductor manufacturing non-processing apparatuses with storage...

Drying apparatus and method using IPA of a semiconductor wafer

Semiconductor nitride film etching system

Drying apparatus and method

Drying apparatus for processing surface of substrate

Method for producing pure water

Apparatus for producing pure water

Apparatus for manufacturing ultrapure water

Aeration apparatus for producing ultrapure water

Wet-process apparatus

Apparatus for treating the surface of a semiconductor substrate

Apparatus and method for producing ultrapure water and method of co...

Device for and method of producing hyperfine frozen particles

Patents Applicationslast 30 patents

Plating apparatus and plating method, and method of manufacturing s...