Craig A. Hickman

Person

Meridan, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Overlay mark and application thereof
- Patent number 9,134,628
- Issue date Sep 15, 2015
- Nanya Technology Corporation
- Jianming Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for implementing and manufacturing reticles for...
- Patent number 8,555,208
- Issue date Oct 8, 2013
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor wafer alignment markers, and associated systems and m...
- Patent number 8,400,634
- Issue date Mar 19, 2013
- Micron Technology, Inc.
- Jianming Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for implementing and manufacturing reticles for...
- Patent number 8,029,947
- Issue date Oct 4, 2011
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic stepper and/or scanner machines including cleanin...
- Patent number 7,370,659
- Issue date May 13, 2008
- Micron Technology, Inc.
- Craig A. Hickman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithographic stepper and/or scanner machines including cleanin...
- Patent number 7,361,234
- Issue date Apr 22, 2008
- Micron Technology, Inc.
- Craig A. Hickman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for irradiating a microlithographic substrate
- Patent number 7,298,453
- Issue date Nov 20, 2007
- Micron Technology, Inc.
- Ulrich C. Boettiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for irradiating a microlithographic substrate
- Patent number 7,038,762
- Issue date May 2, 2006
- Micron Technology, Inc.
- Ulrich C. Boettiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method of correcting exposure defects in photolithography
- Patent number 6,967,707
- Issue date Nov 22, 2005
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment system
- Patent number 6,909,984
- Issue date Jun 21, 2005
- Micron Technology, Inc.
- James W. Laursen
- G05 - CONTROLLING REGULATING
Information Patent Grant
System for processing semiconductor products
- Patent number 6,844,933
- Issue date Jan 18, 2005
- Micron Technology, Inc.
- Craig A. Hickman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spindle chuck cleaner
- Patent number 6,817,057
- Issue date Nov 16, 2004
- Micron Technology, Inc.
- Paul Shirley
- B08 - CLEANING
Information Patent Grant
Device and method of correcting exposure defects in photolithography
- Patent number 6,812,999
- Issue date Nov 2, 2004
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for irradiating a microlithographic substrate
- Patent number 6,784,975
- Issue date Aug 31, 2004
- Micron Technology, Inc.
- Ulrich C. Boettiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method of correcting exposure defects in photolithography
- Patent number 6,727,975
- Issue date Apr 27, 2004
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment system
- Patent number 6,708,131
- Issue date Mar 16, 2004
- Micron Technology, Inc.
- James W. Laursen
- G05 - CONTROLLING REGULATING
Information Patent Grant
System for processing semiconductor products
- Patent number 6,529,274
- Issue date Mar 4, 2003
- Micron Technology, Inc.
- Craig A. Hickman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for processing semiconductor products
- Patent number 6,519,036
- Issue date Feb 11, 2003
- Micron Technology, Inc.
- Craig A. Hickman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for compensating for lens heating resulting from wafer refl...
- Patent number 6,297,877
- Issue date Oct 2, 2001
- Micron Technology, Inc.
- Craig Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OVERLAY MARK AND APPLICATION THEREOF
- Publication number 20130182255
- Publication date Jul 18, 2013
- NANYA TECHNOLOGY CORPORATION
- Jianming Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR IMPLEMENTING AND MANUFACTURING RETICLES FOR...
- Publication number 20120227013
- Publication date Sep 6, 2012
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR WAFER ALIGNMENT MARKERS, AND ASSOCIATED SYSTEMS AND M...
- Publication number 20110194112
- Publication date Aug 11, 2011
- Micron Technology, Inc.
- Jianming Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for in situ photoresist thickness characterization
- Publication number 20070065575
- Publication date Mar 22, 2007
- Paul D. Shirley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for situ photoresist thickness characterizaton
- Publication number 20070056513
- Publication date Mar 15, 2007
- Paul D. Shirley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spindle chuck cleaner
- Publication number 20070056608
- Publication date Mar 15, 2007
- Micron Technology, Inc.
- Paul Shirley
- B08 - CLEANING
Information Patent Application
Method and computer-readable medium for in situ photoresist thickne...
- Publication number 20070061035
- Publication date Mar 15, 2007
- Paul D. Shirley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for implementing and manufacturing reticles for...
- Publication number 20070048627
- Publication date Mar 1, 2007
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for in situ photoresist thickness characterization
- Publication number 20070026134
- Publication date Feb 1, 2007
- Paul D. Shirley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPINDLE CHUCK CLEANER
- Publication number 20060243305
- Publication date Nov 2, 2006
- Micron Technology Inc.
- Paul Shirley
- B08 - CLEANING
Information Patent Application
Photolithographic stepper and/or scanner machines including cleanin...
- Publication number 20060201540
- Publication date Sep 14, 2006
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic stepper and/or scanner machines including cleanin...
- Publication number 20060201535
- Publication date Sep 14, 2006
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for irradiating a microlithographic substrate
- Publication number 20060158631
- Publication date Jul 20, 2006
- Micron Technology, Inc.
- Ulrich C. Boettiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, apparatus, system and computer-readable medium for in situ...
- Publication number 20050148203
- Publication date Jul 7, 2005
- Paul D. Shirley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method of correcting exposure defects in photolithography
- Publication number 20050068513
- Publication date Mar 31, 2005
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for irradiating a microlithographic substrate
- Publication number 20050041228
- Publication date Feb 24, 2005
- Ulrich C. Boettiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic stepper and/or scanner machines including cleanin...
- Publication number 20050028314
- Publication date Feb 10, 2005
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spindle chuck cleaner
- Publication number 20040159333
- Publication date Aug 19, 2004
- Micron Technology, Inc.
- Paul Shirley
- B08 - CLEANING
Information Patent Application
wafer alignment system
- Publication number 20040158423
- Publication date Aug 12, 2004
- James W. Laursen
- G05 - CONTROLLING REGULATING
Information Patent Application
Device and method of correcting exposure defects in photolithography
- Publication number 20030234915
- Publication date Dec 25, 2003
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for processing semiconductor products
- Publication number 20030133114
- Publication date Jul 17, 2003
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spindle chuck cleaner
- Publication number 20030046786
- Publication date Mar 13, 2003
- Paul Shirley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for irradiating a microlithographic substrate
- Publication number 20030044693
- Publication date Mar 6, 2003
- Ulrich C. Boettiger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Craig A. Hickman

Person

Patents Grantslast 30 patents

Overlay mark and application thereof

Systems and methods for implementing and manufacturing reticles for...

Semiconductor wafer alignment markers, and associated systems and m...

Systems and methods for implementing and manufacturing reticles for...

Photolithographic stepper and/or scanner machines including cleanin...

Photolithographic stepper and/or scanner machines including cleanin...

Method and apparatus for irradiating a microlithographic substrate

Method and apparatus for irradiating a microlithographic substrate

Device and method of correcting exposure defects in photolithography

Wafer alignment system

System for processing semiconductor products

Spindle chuck cleaner

Device and method of correcting exposure defects in photolithography

Method and apparatus for irradiating a microlithographic substrate

Device and method of correcting exposure defects in photolithography

Wafer alignment system

System for processing semiconductor products

System for processing semiconductor products

Methods for compensating for lens heating resulting from wafer refl...

Patents Applicationslast 30 patents

OVERLAY MARK AND APPLICATION THEREOF

SYSTEMS AND METHODS FOR IMPLEMENTING AND MANUFACTURING RETICLES FOR...

SEMICONDUCTOR WAFER ALIGNMENT MARKERS, AND ASSOCIATED SYSTEMS AND M...

Method for in situ photoresist thickness characterization

System for situ photoresist thickness characterizaton

Spindle chuck cleaner

Method and computer-readable medium for in situ photoresist thickne...

Systems and methods for implementing and manufacturing reticles for...

Method for in situ photoresist thickness characterization

SPINDLE CHUCK CLEANER

Photolithographic stepper and/or scanner machines including cleanin...

Photolithographic stepper and/or scanner machines including cleanin...

Method and apparatus for irradiating a microlithographic substrate

Method, apparatus, system and computer-readable medium for in situ...

Device and method of correcting exposure defects in photolithography

Method and apparatus for irradiating a microlithographic substrate

Photolithographic stepper and/or scanner machines including cleanin...

Spindle chuck cleaner

wafer alignment system

Device and method of correcting exposure defects in photolithography

System for processing semiconductor products

Spindle chuck cleaner

Method and apparatus for irradiating a microlithographic substrate