Craig MacNaughton

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Statistical overlay error prediction for feed forward and feedback...
- Patent number 10,545,412
- Issue date Jan 28, 2020
- KLA-Tencor Corporation
- Wei Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for using substrate geometry to determine optimum...
- Patent number 9,588,441
- Issue date Mar 7, 2017
- KLA-Tencor Corporation
- Craig W. MacNaughton
- G05 - CONTROLLING REGULATING
Information Patent Grant
Metrology optimized inspection
- Patent number 9,518,932
- Issue date Dec 13, 2016
- KLA-Tencor Corp.
- Allen Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,513,565
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced patterned wafer geometry measurements based design improve...
- Patent number 9,373,165
- Issue date Jun 21, 2016
- KLA-Tencor Corporation
- Amir Azordegan
- G01 - MEASURING TESTING
Information Patent Grant
Statistical overlay error prediction for feed forward and feedback...
- Patent number 9,087,176
- Issue date Jul 21, 2015
- KLA-Tencor Corporation
- Wei Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,029,810
- Issue date May 12, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Statistical Overlay Error Prediction for Feed Forward and Feedback...
- Publication number 20170017162
- Publication date Jan 19, 2017
- KLA-Tenor Corporation
- Wei Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Enhanced Patterned Wafer Geometry Measurements Based Design Improve...
- Publication number 20160071260
- Publication date Mar 10, 2016
- KLA-Tencor Corporation
- Amir Azordegan
- G01 - MEASURING TESTING
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20150212429
- Publication date Jul 30, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Optimized Inspection
- Publication number 20150124247
- Publication date May 7, 2015
- KLA-Tencor Corporation
- Allen Park
- G01 - MEASURING TESTING
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20140353527
- Publication date Dec 4, 2014
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR USING SUBSTRATE GEOMETRY TO DETERMINE OPTIMUM...
- Publication number 20130310966
- Publication date Nov 21, 2013
- KLA-Tencor Technologies Corporation
- Craig W. MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS

Craig MacNaughton

Person

Patents Grantslast 30 patents

Statistical overlay error prediction for feed forward and feedback...

Method and device for using substrate geometry to determine optimum...

Metrology optimized inspection

Using wafer geometry to improve scanner correction effectiveness fo...

Enhanced patterned wafer geometry measurements based design improve...

Statistical overlay error prediction for feed forward and feedback...

Using wafer geometry to improve scanner correction effectiveness fo...

Patents Applicationslast 30 patents

Statistical Overlay Error Prediction for Feed Forward and Feedback...

Enhanced Patterned Wafer Geometry Measurements Based Design Improve...

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

Metrology Optimized Inspection

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

METHOD AND DEVICE FOR USING SUBSTRATE GEOMETRY TO DETERMINE OPTIMUM...