Craig P. Meuchel

Person

Kalispell, MT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing apparatus
- Patent number 7,138,016
- Issue date Nov 21, 2006
- Semitool, Inc.
- Timothy J. Reardon
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor processing apparatus
- Patent number 7,094,291
- Issue date Aug 22, 2006
- Semitool, Inc.
- Timothy J. Reardon
- G11 - INFORMATION STORAGE
Information Patent Grant
Method and apparatus for processing wafers under pressure
- Patent number 6,745,494
- Issue date Jun 8, 2004
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for high-pressure wafer processing and drying
- Patent number 6,543,156
- Issue date Apr 8, 2003
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning semiconductor substrates
- Patent number 6,488,038
- Issue date Dec 3, 2002
- Semitool, Inc.
- Eric J. Bergman
- B08 - CLEANING
Information Patent Grant
Semiconductor processing spray coating apparatus
- Patent number 6,375,741
- Issue date Apr 23, 2002
- Timothy J. Reardon
- G11 - INFORMATION STORAGE
Information Patent Grant
Method and apparatus for high-pressure wafer processing and drying
- Patent number 6,357,142
- Issue date Mar 19, 2002
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for high-pressure wafer processing and drying
- Patent number 6,286,231
- Issue date Sep 11, 2001
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing spray coating apparatus
- Patent number 6,066,575
- Issue date May 23, 2000
- Semitool, Inc.
- Timothy J. Reardon
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor processing spray coating apparatus
- Patent number 5,658,387
- Issue date Aug 19, 1997
- Semitool, Inc.
- Timothy J. Reardon
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
POST ETCH RESIDUE REMOVAL FROM SUBSTRATES
- Publication number 20080083427
- Publication date Apr 10, 2008
- Semitool, Inc.
- Joy Block
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CLEANING EDGES OF A SUBSTRATE
- Publication number 20070193607
- Publication date Aug 23, 2007
- John Ghekiere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for processing wafers under pressure
- Publication number 20030088995
- Publication date May 15, 2003
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for high-pressure wafer processing and drying
- Publication number 20020095816
- Publication date Jul 25, 2002
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing apparatus
- Publication number 20020040679
- Publication date Apr 11, 2002
- TIMOTHY J. REARDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing spray coating apparatus
- Publication number 20020038629
- Publication date Apr 4, 2002
- Timothy J. Reardon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for high-pressure wafer processing and drying
- Publication number 20020026729
- Publication date Mar 7, 2002
- Semitool, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing spray coating apparatus
- Publication number 20010050041
- Publication date Dec 13, 2001
- TIMOTHY J. REARDON
- H01 - BASIC ELECTRIC ELEMENTS

Craig P. Meuchel

Person

Patents Grantslast 30 patents

Semiconductor processing apparatus

Semiconductor processing apparatus

Method and apparatus for processing wafers under pressure

Method and apparatus for high-pressure wafer processing and drying

Method for cleaning semiconductor substrates

Semiconductor processing spray coating apparatus

Method and apparatus for high-pressure wafer processing and drying

Method and apparatus for high-pressure wafer processing and drying

Semiconductor processing spray coating apparatus

Semiconductor processing spray coating apparatus

Patents Applicationslast 30 patents

POST ETCH RESIDUE REMOVAL FROM SUBSTRATES

METHODS AND APPARATUS FOR CLEANING EDGES OF A SUBSTRATE

Method and apparatus for processing wafers under pressure

Method and apparatus for high-pressure wafer processing and drying

Semiconductor processing apparatus

Semiconductor processing spray coating apparatus

Method and apparatus for high-pressure wafer processing and drying

Semiconductor processing spray coating apparatus