Cuc K. Huynh

Person

Jericho, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimized scheduling based on sensitivity data
- Patent number 8,301,288
- Issue date Oct 30, 2012
- International Business Machines Corporation
- Brian T. Denton
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photoresist trimming process
- Patent number 7,960,288
- Issue date Jun 14, 2011
- International Business Machines Corporation
- Shaun Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist trimming process
- Patent number 7,955,988
- Issue date Jun 7, 2011
- International Business Machines Corporation
- Shaun Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to etch chrome for photomask fabrication
- Patent number 7,754,394
- Issue date Jul 13, 2010
- International Business Machines Corporation
- Shaun B Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist trimming process
- Patent number 7,304,000
- Issue date Dec 4, 2007
- International Business Machines Corporation
- Shaun Crawford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CD uniformity of chrome etch to photomask process
- Patent number 7,014,959
- Issue date Mar 21, 2006
- International Business Machines Corporation
- Shaun B. Crawford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to prevent leaving residual metal in CMP process of metal in...
- Patent number 6,599,173
- Issue date Jul 29, 2003
- International Business Machines Corporation
- Jose L. Cruz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for multiphase chemical mechanical polishing
- Patent number 6,468,135
- Issue date Oct 22, 2002
- International Business Machines Corporation
- Jose L. Cruz
- B08 - CLEANING
Information Patent Grant
Off-concentric polishing system design
- Patent number 6,432,823
- Issue date Aug 13, 2002
- International Business Machines Corporation
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Grant
Method for homogenizing device parameters through photoresist plana...
- Patent number 6,387,810
- Issue date May 14, 2002
- International Business Machines Corporation
- Gary J. Beardsley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post CMP cleaning method using a brush cleaner with torque monitor
- Patent number 6,352,596
- Issue date Mar 5, 2002
- International Business Machines Corporation
- Gary Joseph Beardsley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP apparatus with built-in slurry distribution and removal
- Patent number 6,299,515
- Issue date Oct 9, 2001
- International Business Machines Corporation
- Gary J. Beardsley
- B24 - GRINDING POLISHING
Information Patent Grant
Method for chemical mechanical polishing of semiconductor wafer
- Patent number 6,300,246
- Issue date Oct 9, 2001
- International Business Machines Corporation
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Grant
Wafer carrier rinsing mechanism
- Patent number 6,287,178
- Issue date Sep 11, 2001
- International Business Machines Corporation
- Cuc Kim Huynh
- B08 - CLEANING
Information Patent Grant
Post CMP clean brush with torque monitor
- Patent number 6,269,510
- Issue date Aug 7, 2001
- International Business Machines Corporation
- Gary Joseph Beardsley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
pH-buffered slurry and use thereof for polishing
- Patent number 6,190,237
- Issue date Feb 20, 2001
- International Business Machines Corporation
- Cuc Kim Huynh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
In-situ/self-propelled polishing pad conditioner and cleaner
- Patent number 6,179,693
- Issue date Jan 30, 2001
- International Business Machines Corporation
- Gary Joseph Beardsley
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for removing slurry particles
- Patent number 6,171,436
- Issue date Jan 9, 2001
- International Business Machines Corporation
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Grant
CMP apparatus with built-in slurry distribution and removal
- Patent number 6,135,865
- Issue date Oct 24, 2000
- International Business Machines Corporation
- Gary J. Beardsley
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming sidewall spacers using frequency doubling hybrid...
- Patent number 5,981,148
- Issue date Nov 9, 1999
- International Business Machines Corporation
- Jeffrey S. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Downstream monitor for CMP brush cleaners
- Patent number 5,974,868
- Issue date Nov 2, 1999
- International Business Machines Corporation
- Donald M. Decain
- B08 - CLEANING
Information Patent Grant
Method for forming sidewall spacers using frequency doubling hybrid...
- Patent number 5,976,768
- Issue date Nov 2, 1999
- International Business Machines Corporation
- Jeffrey S. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of planarizing semiconductor wafers
- Patent number 5,935,869
- Issue date Aug 10, 1999
- International Business Machines Corporation
- Cuc Huynh
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method of removing slurry particles
- Patent number 5,896,870
- Issue date Apr 27, 1999
- International Business Machines Corporation
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Grant
Downstream monitor for CMP brush cleaners
- Patent number 5,834,642
- Issue date Nov 10, 1998
- International Business Machines Corporation
- Donald M. Decain
- B08 - CLEANING
Information Patent Grant
Silicon wafer cleaning and polishing pads
- Patent number 5,778,481
- Issue date Jul 14, 1998
- International Business Machines Corporation
- Michael R. Amsden
- B08 - CLEANING
Information Patent Grant
Process for removing residue from a semiconductor wafer after chemi...
- Patent number 5,704,987
- Issue date Jan 6, 1998
- International Business Machines Corporation
- Cuc Kim Huynh
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Method to etch chrome for photomask fabrication
- Publication number 20080113275
- Publication date May 15, 2008
- International Business Machines Corporation
- Shaun B. Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TRIMMING PROCESS
- Publication number 20080032214
- Publication date Feb 7, 2008
- International Business Machines Corporation
- Shaun Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TRIMMING PROCESS
- Publication number 20080020586
- Publication date Jan 24, 2008
- International Business Machines Corporation
- Shaun Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TRIMMING PROCESS
- Publication number 20060040504
- Publication date Feb 23, 2006
- International Business Machines Corporation
- Shaun Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZED SCHEDULING BASED ON SENSITIVITY DATA
- Publication number 20050283265
- Publication date Dec 22, 2005
- International Business Machines Corporation
- Brian T. Denton
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPROVED CD UNIFORMITY OF CHROME ETCH TO PHOTOMASK PROCESS
- Publication number 20040262264
- Publication date Dec 30, 2004
- International Business Machines Corporation
- Shaun B. Crawford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Off-concentric polishing system design
- Publication number 20020182866
- Publication date Dec 5, 2002
- Cuc K. Huynh
- B24 - GRINDING POLISHING
Information Patent Application
Post CMP clean brush with torque monitor
- Publication number 20020005212
- Publication date Jan 17, 2002
- International Business Machines Corporation
- Gary J. Beardsley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer carrier rinsing mechanism
- Publication number 20010023166
- Publication date Sep 20, 2001
- Cuc Kim Huynh
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR HOMOGENIZING DEVICE PARAMETERS THROUGH PHOTORESIST PLANA...
- Publication number 20010002328
- Publication date May 31, 2001
- GARY J. BEARDSLEY
- H01 - BASIC ELECTRIC ELEMENTS

Cuc K. Huynh

Person

Patents Grantslast 30 patents

Optimized scheduling based on sensitivity data

Photoresist trimming process

Photoresist trimming process

Method to etch chrome for photomask fabrication

Photoresist trimming process

CD uniformity of chrome etch to photomask process

Method to prevent leaving residual metal in CMP process of metal in...

Method and apparatus for multiphase chemical mechanical polishing

Off-concentric polishing system design

Method for homogenizing device parameters through photoresist plana...

Post CMP cleaning method using a brush cleaner with torque monitor

CMP apparatus with built-in slurry distribution and removal

Method for chemical mechanical polishing of semiconductor wafer

Wafer carrier rinsing mechanism

Post CMP clean brush with torque monitor

pH-buffered slurry and use thereof for polishing

In-situ/self-propelled polishing pad conditioner and cleaner

Apparatus for removing slurry particles

CMP apparatus with built-in slurry distribution and removal

Method for forming sidewall spacers using frequency doubling hybrid...

Downstream monitor for CMP brush cleaners

Method for forming sidewall spacers using frequency doubling hybrid...

Method of planarizing semiconductor wafers

Method of removing slurry particles

Downstream monitor for CMP brush cleaners

Silicon wafer cleaning and polishing pads

Process for removing residue from a semiconductor wafer after chemi...

Patents Applicationslast 30 patents

Method to etch chrome for photomask fabrication

PHOTORESIST TRIMMING PROCESS

PHOTORESIST TRIMMING PROCESS

PHOTORESIST TRIMMING PROCESS

OPTIMIZED SCHEDULING BASED ON SENSITIVITY DATA

IMPROVED CD UNIFORMITY OF CHROME ETCH TO PHOTOMASK PROCESS

Off-concentric polishing system design

Post CMP clean brush with torque monitor

Wafer carrier rinsing mechanism

METHOD FOR HOMOGENIZING DEVICE PARAMETERS THROUGH PHOTORESIST PLANA...