Cynthia B. Brooks

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Master template replication
- Patent number 9,122,148
- Issue date Sep 1, 2015
- Canon Nanotechnologies, Inc.
- Michael N. Miller
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Critical dimension control during template formation
- Patent number 8,545,709
- Issue date Oct 1, 2013
- Molecular Imprints, Inc.
- Cynthia B. Brooks
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-step process for etching photomasks
- Patent number 7,371,485
- Issue date May 13, 2008
- Applied Materials, Inc.
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated phase angle and optical critical dimension measurement m...
- Patent number 7,250,309
- Issue date Jul 31, 2007
- Applied Materials, Inc.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-step process for etching photomasks
- Patent number 6,960,413
- Issue date Nov 1, 2005
- Applied Materials, Inc.
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS
- Publication number 20120288686
- Publication date Nov 15, 2012
- Molecular Imprints, Inc.
- Frank Y. Xu
- B82 - NANO-TECHNOLOGY
Information Patent Application
CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION
- Publication number 20120187085
- Publication date Jul 26, 2012
- Molecular Imprints, Inc.
- Cynthia B. Brooks
- B82 - NANO-TECHNOLOGY
Information Patent Application
Master Template Replication
- Publication number 20100109194
- Publication date May 6, 2010
- Molecular Imprints, Inc.
- Michael N. Miller
- G11 - INFORMATION STORAGE
Information Patent Application
Double Sidewall Angle Nano-Imprint Template
- Publication number 20100095862
- Publication date Apr 22, 2010
- Molecular Imprints, Inc.
- Michael N. Miller
- B82 - NANO-TECHNOLOGY
Information Patent Application
CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION
- Publication number 20090212012
- Publication date Aug 27, 2009
- Molecular Imprints, Inc.
- Cynthia B. Brooks
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reduced Residual Formation in Etched Multi-Layer Stacks
- Publication number 20090053535
- Publication date Feb 26, 2009
- Molecular Imprints, Inc.
- Frank Y. Xu
- B82 - NANO-TECHNOLOGY
Information Patent Application
INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...
- Publication number 20070296980
- Publication date Dec 27, 2007
- ALFRED W. MAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-step process for etching photomasks
- Publication number 20060049137
- Publication date Mar 9, 2006
- APPLIED MATERIALS, INC.
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated phase angle and optical critical dimension measurement m...
- Publication number 20050153564
- Publication date Jul 14, 2005
- APPLIED MATERIALS, INC.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-step process for etching photomasks
- Publication number 20050008945
- Publication date Jan 13, 2005
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Cynthia B. Brooks

Person

Patents Grantslast 30 patents

Master template replication

Critical dimension control during template formation

Multi-step process for etching photomasks

Integrated phase angle and optical critical dimension measurement m...

Multi-step process for etching photomasks

Patents Applicationslast 30 patents

REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS

CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION

Master Template Replication

Double Sidewall Angle Nano-Imprint Template

CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION

Reduced Residual Formation in Etched Multi-Layer Stacks

INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...

Multi-step process for etching photomasks

Integrated phase angle and optical critical dimension measurement m...

Multi-step process for etching photomasks