Daehee Weon

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Cupertino, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
High lateral to vertical ratio etch process for device manufacturing
- Patent number 11,031,233
- Issue date Jun 8, 2021
- Applied Materials, Inc.
- Kyeong Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High lateral to vertical ratio etch process for device manufacturing
- Patent number 10,460,921
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Kyeong Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High lateral to vertical ratio etch process for device manufacturing
- Patent number 8,529,776
- Issue date Sep 10, 2013
- Applied Materials, Inc.
- Kyeong Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation etch process
- Patent number 8,133,817
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH LATERAL TO VERTICAL RATIO ETCH PROCESS FOR DEVICE MANUFACTURING
- Publication number 20200013610
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Kyeong Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH LATERAL TO VERTICAL RATIO ETCH PROCESS FOR DEVICE MANUFACTURING
- Publication number 20130319614
- Publication date Dec 5, 2013
- Applied Materials, Inc.
- Kyeong Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH LATERAL TO VERTICAL RATIO ETCH PROCESS FOR DEVICE MANUFACTURING
- Publication number 20130029490
- Publication date Jan 31, 2013
- Kyeong Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW TRENCH ISOLATION ETCH PROCESS
- Publication number 20090170333
- Publication date Jul 2, 2009
- APPLIED MATERIALS, INC.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS