Daemian Raj

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integration of dual remote plasmas sources for flowable CVD
- Patent number 10,934,620
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Ying Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to prevent deposition rate/thickness drift, re...
- Patent number 10,428,426
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Daemian Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and hardware for cleaning UV chambers
- Patent number 9,506,145
- Issue date Nov 29, 2016
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and hardware for cleaning UV chambers
- Patent number 9,364,871
- Issue date Jun 14, 2016
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microelectronic structure including a low k dielectric and a method...
- Patent number 8,349,746
- Issue date Jan 8, 2013
- Applied Materials, Inc.
- Bo Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of uniformity control for low flow process and chamber to c...
- Patent number 7,829,145
- Issue date Nov 9, 2010
- Applied Materials, Inc.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniformity control for low flow process and chamber to chamber matc...
- Patent number 7,622,005
- Issue date Nov 24, 2009
- Applied Materials, Inc.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Blocker plate bypass to distribute gases in a chemical vapor deposi...
- Patent number 7,572,337
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Juan Carlos Rocha-Alvarez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Situ oxide cap layer development
- Patent number 7,273,823
- Issue date Sep 25, 2007
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Strengthening the interface between dielectric layers and barrier l...
- Patent number 7,189,658
- Issue date Mar 13, 2007
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DIFFUSER DESIGN FOR FLOWABLE CVD
- Publication number 20180258531
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Ying MA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS OF REMOTE PLASMAS FLOWABLE CVD CHAMBER
- Publication number 20180230597
- Publication date Aug 16, 2018
- Applied Materials, Inc.
- Ying MA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATION OF DUAL REMOTE PLASMAS SOURCES FOR FLOWABLE CVD
- Publication number 20180148840
- Publication date May 31, 2018
- Applied Materials, Inc.
- Ying MA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD & APPARATUS TO PREVENT DEPOSITION RATE/THICKNESS DRIFT, REDU...
- Publication number 20170306493
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Daemian RAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND HARDWARE FOR CLEANING UV CHAMBERS
- Publication number 20160296981
- Publication date Oct 13, 2016
- Applied Materials, Inc.
- Sanjeev BALUJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WET CLEANING OF A CHAMBER COMPONENT
- Publication number 20160017263
- Publication date Jan 21, 2016
- Applied Materials, Inc.
- Ren-Guan DUAN
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
BOTTOM PUMP AND PURGE AND BOTTOM OZONE CLEAN HARDWARE TO REDUCE FAL...
- Publication number 20150211114
- Publication date Jul 30, 2015
- Applied Materials, Inc.
- Abhijit KANGUDE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO DETECT VALVE DEVIATION
- Publication number 20140261703
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Daemian RAJ
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD AND HARDWARE FOR CLEANING UV CHAMBERS
- Publication number 20140053866
- Publication date Feb 27, 2014
- Applied Materials, Inc.
- Sanjeev BALUJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microelectronic structure including a low K dielectric and a method...
- Publication number 20110204492
- Publication date Aug 25, 2011
- APPLIED MATERIALS, INC.
- Bo Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIFORMITY CONTROL FOR LOW FLOW PROCESS AND CHAMBER TO CHAMBER MATC...
- Publication number 20090047446
- Publication date Feb 19, 2009
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In situ oxide cap layer development
- Publication number 20060276054
- Publication date Dec 7, 2006
- APPLIED MATERIALS, INC.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Strengthening the interface between dielectric layers and barrier l...
- Publication number 20060252273
- Publication date Nov 9, 2006
- APPLIED MATERIALS, INC.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method to reduce plasma damage during cleaning of semiconductor waf...
- Publication number 20060054183
- Publication date Mar 16, 2006
- Thomas Nowak
- B08 - CLEANING
Information Patent Application
Uniformity control for low flow process and chamber to chamber matc...
- Publication number 20050263072
- Publication date Dec 1, 2005
- APPLIED MATERIALS, INC.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Blocker plate bypass to distribute gases in a chemical vapor deposi...
- Publication number 20050263248
- Publication date Dec 1, 2005
- APPLIED MATERIALS, INC.
- Juan Carlos Rocha-Alvarez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Daemian Raj

Person

Patents Grantslast 30 patents

Integration of dual remote plasmas sources for flowable CVD

Method and apparatus to prevent deposition rate/thickness drift, re...

Method and hardware for cleaning UV chambers

Method and hardware for cleaning UV chambers

Microelectronic structure including a low k dielectric and a method...

Methods of uniformity control for low flow process and chamber to c...

Uniformity control for low flow process and chamber to chamber matc...

Blocker plate bypass to distribute gases in a chemical vapor deposi...

Situ oxide cap layer development

Strengthening the interface between dielectric layers and barrier l...

Patents Applicationslast 30 patents

DIFFUSER DESIGN FOR FLOWABLE CVD

METHOD AND APPARATUS OF REMOTE PLASMAS FLOWABLE CVD CHAMBER

INTEGRATION OF DUAL REMOTE PLASMAS SOURCES FOR FLOWABLE CVD

METHOD & APPARATUS TO PREVENT DEPOSITION RATE/THICKNESS DRIFT, REDU...

METHOD AND HARDWARE FOR CLEANING UV CHAMBERS

WET CLEANING OF A CHAMBER COMPONENT

BOTTOM PUMP AND PURGE AND BOTTOM OZONE CLEAN HARDWARE TO REDUCE FAL...

METHOD TO DETECT VALVE DEVIATION

METHOD AND HARDWARE FOR CLEANING UV CHAMBERS

Microelectronic structure including a low K dielectric and a method...

UNIFORMITY CONTROL FOR LOW FLOW PROCESS AND CHAMBER TO CHAMBER MATC...

In situ oxide cap layer development

Strengthening the interface between dielectric layers and barrier l...

Method to reduce plasma damage during cleaning of semiconductor waf...

Uniformity control for low flow process and chamber to chamber matc...

Blocker plate bypass to distribute gases in a chemical vapor deposi...