Dai Igarashi

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Miyagi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,867,777
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Wataru Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,784,088
- Issue date Sep 22, 2020
- Tokyo Electron Limited
- Dai Igarashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE CONTROLLING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230378004
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Dai IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TEMPERATURE CORRECTION...
- Publication number 20220277939
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Rei Ibuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20190326103
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Dai Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190279850
- Publication date Sep 12, 2019
- TOKYO ELECTRON LIMITED
- Wataru Takayama
- H01 - BASIC ELECTRIC ELEMENTS