Dai Kawasaki

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,852,726
- Issue date Oct 7, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and circuit formation substrate us...
- Patent number 8,614,051
- Issue date Dec 24, 2013
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition and circuit formation substrate us...
- Patent number 8,304,160
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,231,959
- Issue date Jul 31, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-type photosensitive resin composition, method for producin...
- Patent number 8,097,386
- Issue date Jan 17, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Hajime Nakano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition, pattern forming method and electr...
- Patent number 7,642,018
- Issue date Jan 5, 2010
- Hitachi Chemical DuPont Microsystems, Ltd.
- Dai Kawasaki
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...
- Publication number 20120328856
- Publication date Dec 27, 2012
- HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
- Tomonori MINEGISHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20120263920
- Publication date Oct 18, 2012
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...
- Publication number 20100260983
- Publication date Oct 14, 2010
- HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
- Tomonori MINEGISHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...
- Publication number 20100227126
- Publication date Sep 9, 2010
- Hajime Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20080220222
- Publication date Sep 11, 2008
- Ooe Masayuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTR...
- Publication number 20070218400
- Publication date Sep 20, 2007
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Dai Kawasaki
- G11 - INFORMATION STORAGE

Dai Kawasaki

Person

Patents Grantslast 30 patents

Photosensitive polymer composition, method of producing pattern and...

Photosensitive resin composition and circuit formation substrate us...

Photosensitive resin composition and circuit formation substrate us...

Photosensitive polymer composition, method of producing pattern and...

Positive-type photosensitive resin composition, method for producin...

Photosensitive resin composition, pattern forming method and electr...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...

Photosensitive Polymer Composition, Method of Producing Pattern and...

PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...

Photosensitive Polymer Composition, Method of Producing Pattern and...

PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTR...