Dai Oguro

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition
- Patent number 9,897,913
- Issue date Feb 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy resin curing agent
- Patent number 9,605,110
- Issue date Mar 28, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Shuichi Ueno
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyester resin and optical lens
- Patent number 9,234,986
- Issue date Jan 12, 2016
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Bicyclohexane derivative compound and manufacturing method of the same
- Patent number 9,150,491
- Issue date Oct 6, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Glycol compound having dioxane structure and method for producing t...
- Patent number 8,859,787
- Issue date Oct 14, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,846,292
- Issue date Sep 30, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Glycol compound having dioxane structure and method for producing t...
- Patent number 8,846,957
- Issue date Sep 30, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cyclic compound, method of producing the same, radiation sensitive...
- Patent number 8,829,247
- Issue date Sep 9, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Hiromi Hayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for resist and radiation-sensitive composition specification
- Patent number 8,802,353
- Issue date Aug 12, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Cyclic compound, process for preparation thereof, radiation-sensiti...
- Patent number 8,748,078
- Issue date Jun 10, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Hiromi Hayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyester resin and optical lens
- Patent number 8,674,054
- Issue date Mar 18, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming base film for lithography and method for fo...
- Patent number 8,592,134
- Issue date Nov 26, 2013
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-co...
- Patent number 8,563,665
- Issue date Oct 22, 2013
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Kita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-co...
- Patent number 8,524,952
- Issue date Sep 3, 2013
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Kita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-co...
- Patent number 8,519,177
- Issue date Aug 27, 2013
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Kita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for resist and radiation-sensitive composition
- Patent number 8,350,096
- Issue date Jan 8, 2013
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alcohol compound having dioxane structure and process for producing...
- Patent number 8,324,407
- Issue date Dec 4, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,110,334
- Issue date Feb 7, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for resist and radiation-sensitive composition
- Patent number 7,919,223
- Issue date Apr 5, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition
- Patent number 7,871,751
- Issue date Jan 18, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermoplastic resin composition
- Patent number 7,067,186
- Issue date Jun 27, 2006
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyester based resin composition and molded product therefrom
- Patent number 6,740,376
- Issue date May 25, 2004
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyester resin and molded article
- Patent number 6,447,859
- Issue date Sep 10, 2002
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
1,3-BIS(HYDROXYPHENYL)-5-ETHYLADAMANTANE COMPOUND AND METHOD FOR PR...
- Publication number 20160244389
- Publication date Aug 25, 2016
- MITSUBISHI GAS CHEMICAL COMPANY, INC
- Goh NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
EPOXY RESIN CURING AGENT
- Publication number 20150291729
- Publication date Oct 15, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Shuichi Ueno
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20150030980
- Publication date Jan 29, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYESTER RESIN AND OPTICAL LENS
- Publication number 20140142273
- Publication date May 22, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- G02 - OPTICS
Information Patent Application
BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE...
- Publication number 20130030211
- Publication date Jan 31, 2013
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION
- Publication number 20130004896
- Publication date Jan 3, 2013
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYESTER RESIN AND OPTICAL LENS
- Publication number 20120289676
- Publication date Nov 15, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE...
- Publication number 20120251947
- Publication date Oct 4, 2012
- Hiromi Hayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CO...
- Publication number 20120238775
- Publication date Sep 20, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Kita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CO...
- Publication number 20120238781
- Publication date Sep 20, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Kita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20120171379
- Publication date Jul 5, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITI...
- Publication number 20120164576
- Publication date Jun 28, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Hiromi Hayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ALCOHOL COMPOUND HAVING DIOXANE STRUCTURE AND PROCESS FOR PRODUCING...
- Publication number 20110282076
- Publication date Nov 17, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
GLYCOL COMPOUND HAVING DIOXANE STRUCTURE AND METHOD FOR PRODUCING T...
- Publication number 20110275840
- Publication date Nov 10, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
GLYCOL COMPOUND HAVING DIOXANE STRUCTURE AND METHOD FOR PRODUCING T...
- Publication number 20110269976
- Publication date Nov 3, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Takuya Minezaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20110165516
- Publication date Jul 7, 2011
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CO...
- Publication number 20110009574
- Publication date Jan 13, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Kita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FO...
- Publication number 20100316950
- Publication date Dec 16, 2010
- Mitsubishi Gas Chemical Company, Inc.
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20100047709
- Publication date Feb 25, 2010
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel triphenylmethane derivative, organic gellant containing the s...
- Publication number 20090176095
- Publication date Jul 9, 2009
- Dai Oguro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist composition
- Publication number 20080153031
- Publication date Jun 26, 2008
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound for Resist and Radiation-Sensitive Composition
- Publication number 20080113294
- Publication date May 15, 2008
- MITSUBISHI GAS CHEMICAL COMPANY, INC
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20070059632
- Publication date Mar 15, 2007
- Dai Oguro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Thermoplastic resin composition
- Publication number 20050075466
- Publication date Apr 7, 2005
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition
- Publication number 20040191672
- Publication date Sep 30, 2004
- Dai Oguro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polyester based resin composition and molded product therefrom
- Publication number 20030068455
- Publication date Apr 10, 2003
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polyester resin and molded article
- Publication number 20020010309
- Publication date Jan 24, 2002
- Dai Oguro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Radiation-sensitive composition

Epoxy resin curing agent

Polyester resin and optical lens

Bicyclohexane derivative compound and manufacturing method of the same

Glycol compound having dioxane structure and method for producing t...

Radiation-sensitive composition

Glycol compound having dioxane structure and method for producing t...

Cyclic compound, method of producing the same, radiation sensitive...

Compound for resist and radiation-sensitive composition specification

Cyclic compound, process for preparation thereof, radiation-sensiti...

Polyester resin and optical lens

Composition for forming base film for lithography and method for fo...

Modified naphthalene formaldehyde resin, tricyclodecane skeleton-co...

Modified naphthalene formaldehyde resin, tricyclodecane skeleton-co...

Modified naphthalene formaldehyde resin, tricyclodecane skeleton-co...

Compound for resist and radiation-sensitive composition

Alcohol compound having dioxane structure and process for producing...

Radiation-sensitive composition

Compound for resist and radiation-sensitive composition

Resist composition

Thermoplastic resin composition

Polyester based resin composition and molded product therefrom

Polyester resin and molded article

Patents Applicationslast 30 patents

1,3-BIS(HYDROXYPHENYL)-5-ETHYLADAMANTANE COMPOUND AND METHOD FOR PR...

EPOXY RESIN CURING AGENT

RADIATION-SENSITIVE COMPOSITION

POLYESTER RESIN AND OPTICAL LENS

BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE...

COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION

POLYESTER RESIN AND OPTICAL LENS

CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE...

MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CO...

MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CO...

RADIATION-SENSITIVE COMPOSITION

CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITI...

ALCOHOL COMPOUND HAVING DIOXANE STRUCTURE AND PROCESS FOR PRODUCING...

GLYCOL COMPOUND HAVING DIOXANE STRUCTURE AND METHOD FOR PRODUCING T...

GLYCOL COMPOUND HAVING DIOXANE STRUCTURE AND METHOD FOR PRODUCING T...

COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION

MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CO...

COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FO...

RADIATION-SENSITIVE COMPOSITION

Novel triphenylmethane derivative, organic gellant containing the s...

Resist composition

Compound for Resist and Radiation-Sensitive Composition

Method of manufacturing a semiconductor device

Thermoplastic resin composition

Resist composition

Polyester based resin composition and molded product therefrom

Polyester resin and molded article