Daiki Satoh

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,830,751
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,004,717
- Issue date May 11, 2021
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and maintenance method thereof
- Patent number 9,613,837
- Issue date Apr 4, 2017
- Tokyo Electron Limited
- Shigeru Senzaki
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Focus ring, plasma etching apparatus and plasma etching method
- Patent number 8,192,577
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring, plasma etching apparatus and plasma etching method
- Patent number 7,618,515
- Issue date Nov 17, 2009
- Tokyo Electron Limited
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover ring
- Patent number D560284
- Issue date Jan 22, 2008
- Tokyo Electron Limited
- Keiichi Nagakubo
- D24 - Medical and laboratory equipment
Information Patent Grant
Cover ring
- Patent number D559994
- Issue date Jan 15, 2008
- Tokyo Electron Limited
- Keiichi Nagakubo
- D24 - Medical and laboratory equipment
Information Patent Grant
Cover ring
- Patent number D559993
- Issue date Jan 15, 2008
- Tokyo Electron Limited
- Keiichi Nagakubo
- D24 - Medical and laboratory equipment

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240339303
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING, STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210319987
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Ryo CHIBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210233794
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20210082733
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190088523
- Publication date Mar 21, 2019
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20180090361
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD THEREOF
- Publication number 20150086302
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Shigeru Senzaki
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
FOCUS RING, PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20090255902
- Publication date Oct 15, 2009
- TOKYO ELECTRON LIMITED
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus ring, plasma etching apparatus and plasma etching method
- Publication number 20060102288
- Publication date May 18, 2006
- TOKYO ELECTRON LIMITED
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS

Daiki Satoh

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Substrate processing apparatus and maintenance method thereof

Focus ring, plasma etching apparatus and plasma etching method

Focus ring, plasma etching apparatus and plasma etching method

Cover ring

Cover ring

Cover ring

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

EDGE RING, STAGE AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD THEREOF

FOCUS RING, PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Focus ring, plasma etching apparatus and plasma etching method