Daimian Wang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Speed control system for an autonomous mobile device
- Patent number 11,989,026
- Issue date May 21, 2024
- Amazon Technologies, Inc.
- Chen Wang
- G01 - MEASURING TESTING
Information Patent Grant
System for path planning in areas outside of sensor field of view b...
- Patent number 11,960,288
- Issue date Apr 16, 2024
- Amazon Technologies, Inc.
- Yue Hu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Automatic selection of metrology target measurement recipes
- Patent number 10,782,616
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate measurement recipe configuration to improve device matching
- Patent number 10,691,029
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Ning Gu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Source multiplexing illumination for mask inspection
- Patent number 9,625,810
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoemission monitoring of EUV mirror and mask surface contaminati...
- Patent number 9,453,801
- Issue date Sep 27, 2016
- KLA-Tencor Corporation
- Li Wang
- G01 - MEASURING TESTING
Information Patent Grant
Spectral purity filter and light monitor for an EUV reticle inspect...
- Patent number 9,348,214
- Issue date May 24, 2016
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Phase grating for mask inspection system
- Patent number 9,151,881
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system with time multiplexed sources for reticle inspe...
- Patent number 9,151,718
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
EUV actinic reticle inspection system using imaging sensor with thi...
- Patent number 8,916,831
- Issue date Dec 23, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Multiplexing EUV sources in reticle inspection
- Patent number 8,917,432
- Issue date Dec 23, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE MEASUREMENT RECIPE CONFIGURATION TO IMPROVE DEVICE MATCHING
- Publication number 20190250519
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Ning GU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTOMATIC SELECTION OF METROLOGY TARGET MEASUREMENT RECIPES
- Publication number 20190204750
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Daimian WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE...
- Publication number 20140217298
- Publication date Aug 7, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER
- Publication number 20140151580
- Publication date Jun 5, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G02 - OPTICS
Information Patent Application
Phase Grating For Mask Inspection System
- Publication number 20140131586
- Publication date May 15, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G02 - OPTICS
Information Patent Application
MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION
- Publication number 20140036333
- Publication date Feb 6, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS
Information Patent Application
PHOTOEMISSION MONITORING OF EUV MIRROR AND MASK SURFACE CONTAMINATI...
- Publication number 20130313442
- Publication date Nov 28, 2013
- KLA-Tencor Corporation, a Delaware Corporation
- Li Wang
- G01 - MEASURING TESTING
Information Patent Application
Illumination System with Time Multiplexed Sources for Reticle Inspe...
- Publication number 20130242295
- Publication date Sep 19, 2013
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
EUV ACTINIC RETICLE INSPECTION SYSTEM USING IMAGING SENSOR WITH THI...
- Publication number 20120235049
- Publication date Sep 20, 2012
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION
- Publication number 20120236281
- Publication date Sep 20, 2012
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Daimian Wang

Person

Patents Grantslast 30 patents

Speed control system for an autonomous mobile device

System for path planning in areas outside of sensor field of view b...

Automatic selection of metrology target measurement recipes

Substrate measurement recipe configuration to improve device matching

Source multiplexing illumination for mask inspection

Photoemission monitoring of EUV mirror and mask surface contaminati...

Spectral purity filter and light monitor for an EUV reticle inspect...

Phase grating for mask inspection system

Illumination system with time multiplexed sources for reticle inspe...

EUV actinic reticle inspection system using imaging sensor with thi...

Multiplexing EUV sources in reticle inspection

Patents Applicationslast 30 patents

SUBSTRATE MEASUREMENT RECIPE CONFIGURATION TO IMPROVE DEVICE MATCHING

AUTOMATIC SELECTION OF METROLOGY TARGET MEASUREMENT RECIPES

SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE...

METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER

Phase Grating For Mask Inspection System

MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION

PHOTOEMISSION MONITORING OF EUV MIRROR AND MASK SURFACE CONTAMINATI...

Illumination System with Time Multiplexed Sources for Reticle Inspe...

EUV ACTINIC RETICLE INSPECTION SYSTEM USING IMAGING SENSOR WITH THI...

SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION