Daisaku MATSUKAWA

Follow

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive resin composition, patterned cured film pro...
- Patent number 11,048,167
- Issue date Jun 29, 2021
- HD MICROSYSTEMS, LTD.
- Daisaku Matsukawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
POLYIMIDE PRECURSOR, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOS...
- Publication number 20240092973
- Publication date Mar 21, 2024
- HD MICROSYSTEMS, LTD.
- Naoto NAGAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive Resin Composition, Method Of Manufacturing Pattern C...
- Publication number 20220276555
- Publication date Sep 1, 2022
- HD MICROSYSTEMS, LTD.
- Shingo Tahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...
- Publication number 20210382391
- Publication date Dec 9, 2021
- HD MICROSYSTEMS, LTD.
- Hiroko YOTSUYANAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20190049842
- Publication date Feb 14, 2019
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Daisaku MATSUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNED CURED FILM PRO...
- Publication number 20180074403
- Publication date Mar 15, 2018
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Daisaku MATSUKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...