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Daisuke ASAKAWA
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Haibara-gun, JP
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Patents Grants
last 30 patents
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Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
Patent number
12,044,967
Issue date
Jul 23, 2024
FUJIFILM Corporation
Daisuke Asakawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
12,032,290
Issue date
Jul 9, 2024
FUJIFILM Corporation
Daisuke Asakawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
12,007,688
Issue date
Jun 11, 2024
FUJIFILM Corporation
Daisuke Asakawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation sensitive resin composition, act...
Patent number
11,073,762
Issue date
Jul 27, 2021
FUJIFILM Corporation
Daisuke Asakawa
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210318616
Publication date
Oct 14, 2021
FUJIFILM CORPORATION
Daisuke ASAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210191265
Publication date
Jun 24, 2021
FUJIFILM CORPORATION
Kazunari YAGI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
Publication number
20210109446
Publication date
Apr 15, 2021
FUJIFILM CORPORATION
Akiyoshi Goto
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210072642
Publication date
Mar 11, 2021
FUJIFILM CORPORATION
Daisuke ASAKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...
Publication number
20200401045
Publication date
Dec 24, 2020
FUJIFILM CORPORATION
Daisuke ASAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20190294042
Publication date
Sep 26, 2019
FUJIFILM CORPORATION
Keita KATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20190294043
Publication date
Sep 26, 2019
FUJIFILM CORPORATION
Daisuke Asakawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20190196326
Publication date
Jun 27, 2019
FUJIFILM CORPORATION
Masafumi KOJIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20180292751
Publication date
Oct 11, 2018
FUJIFILM CORPORATION
Daisuke ASAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY