Daisuke Goto

Person

Koshi-shi, Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing liquid nozzle and cleaning apparatus
- Patent number 12,109,580
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Daisuke Goto
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,051,605
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle, substrate processing apparatus, and substrate processing me...
- Patent number 12,007,692
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Hiroki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus
- Patent number 11,955,352
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Hiroki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 11,024,518
- Issue date Jun 1, 2021
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240157408
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Daisuke GOTO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE
- Publication number 20240124984
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yusuke HASHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING ME...
- Publication number 20230185199
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF MIST GUARD
- Publication number 20230001458
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Yusuke Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PROCESSING LIQUID NOZZLE AND CLEANING APPARATUS
- Publication number 20220371041
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Daisuke GOTO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220115249
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220112603
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210210363
- Publication date Jul 8, 2021
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180221925
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS

Daisuke Goto

Person

Patents Grantslast 30 patents

Processing liquid nozzle and cleaning apparatus

Substrate processing apparatus

Nozzle, substrate processing apparatus, and substrate processing me...

Substrate processing apparatus

Substrate processing apparatus, substrate processing method and rec...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE

NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING ME...

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF MIST GUARD

PROCESSING LIQUID NOZZLE AND CLEANING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...