Daisuke HAYASHI

Person

Kurokawa-gun, Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Amplification device and transmission/reception system
- Patent number 11,955,937
- Issue date Apr 9, 2024
- KODEN ELECTRONICS CO., LTD.
- Daisuke Hayashi
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Substrate-floatation-type laser processing apparatus and method for...
- Patent number 11,749,545
- Issue date Sep 5, 2023
- JSW AKTINA SYSTEM CO., LTD.
- Daisuke Hayashi
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Plasma processing apparatus
- Patent number 11,735,392
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and electrode member
- Patent number 11,421,323
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 11,387,080
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,380,526
- Issue date Jul 5, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure for automatic in-situ replacement of a part of an electro...
- Patent number 11,380,573
- Issue date Jul 5, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placing table and plasma treatment apparatus
- Patent number 11,373,884
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,289,356
- Issue date Mar 29, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,232,967
- Issue date Jan 25, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,011,347
- Issue date May 18, 2021
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Verifying the terms of use for access to a service
- Patent number 10,915,708
- Issue date Feb 9, 2021
- International Business Machines Corporation
- Taku Aratsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Technique used in text analysis in a safe manner
- Patent number 10,769,308
- Issue date Sep 8, 2020
- International Business Machines Corporation
- Daisuke Hayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Placing table and plasma treatment apparatus
- Patent number 10,679,869
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Applying update to snapshots of virtual machine
- Patent number 10,394,547
- Issue date Aug 27, 2019
- International Business Machines Corporation
- Yuto Fukui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Verifying the terms of use for access to a service
- Patent number 10,387,567
- Issue date Aug 20, 2019
- International Business Machines Corporation
- Taku Aratsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Verifying the terms of use for access to a service
- Patent number 10,380,245
- Issue date Aug 13, 2019
- International Business Machines Corporation
- Taku Aratsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Temperature control apparatus, temperature control method and recor...
- Patent number 10,375,763
- Issue date Aug 6, 2019
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 10,340,174
- Issue date Jul 2, 2019
- Tokyo Electron Limited
- Shin Yamaguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma etching apparatus
- Patent number 10,153,138
- Issue date Dec 11, 2018
- Tokyo Electron Limited
- Tadashi Aoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Applying update to snapshots of virtual machine
- Patent number 10,140,115
- Issue date Nov 27, 2018
- International Business Machines Corporation
- Yuto Fukui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Technique used in text analysis in a safe manner
- Patent number 10,133,879
- Issue date Nov 20, 2018
- International Business Machines Corporation
- Daisuke Hayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Applying update to snapshots of virtual machine
- Patent number 10,083,022
- Issue date Sep 25, 2018
- International Business Machines Corporation
- Yuto Fukui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing electrostatic chuck having dot structure on...
- Patent number 10,074,552
- Issue date Sep 11, 2018
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protecting confidential information
- Patent number 10,061,937
- Issue date Aug 28, 2018
- International Business Machines Corporation
- Daisuke Hayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Protecting confidential information
- Patent number 10,032,046
- Issue date Jul 24, 2018
- International Business Machines Corporation
- Daisuke Hayashi
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Substrate processing apparatus
- Patent number 10,026,596
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas shower structure and substrate processing apparatus
- Patent number 9,550,194
- Issue date Jan 24, 2017
- Tokyo Electron Limited
- Daisuke Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Generating an ordered list of managed targets
- Patent number 9,529,607
- Issue date Dec 27, 2016
- International Business Machines Corporation
- Mihoko Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bonding method, mounting table and substrate processing apparatus
- Patent number 9,520,814
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Daisuke Hayashi
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE-FLOATATION-TYPE LASER PROCESSING APPARATUS AND METHOD FOR...
- Publication number 20230343618
- Publication date Oct 26, 2023
- JSW Aktina System Co., Ltd.
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20220301833
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20220148858
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSFER DEVICE, TRANSFER SYSTEM, AND END EFFECTOR
- Publication number 20220051928
- Publication date Feb 17, 2022
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR AUTOMATIC IN-SITU REPLACEMENT OF A PART OF AN ELECTRO...
- Publication number 20210384060
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR SUPPORTING SUBSTRATE HAVING THERMAL EXPANSION COEFFICIENT
- Publication number 20210305077
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210280385
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMPLIFICATION DEVICE AND TRANSMISSION/RECEPTION SYSTEM
- Publication number 20210242841
- Publication date Aug 5, 2021
- Koden Electronics Co., Ltd.
- Daisuke HAYASHI
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD FOR REPLACING EDGE RING
- Publication number 20210118648
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20210098238
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20210066049
- Publication date Mar 4, 2021
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLA...
- Publication number 20210020418
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE-FLOATATION-TYPE LASER PROCESSING APPARATUS AND METHOD FOR...
- Publication number 20210020481
- Publication date Jan 21, 2021
- The Japan Steel Works, Ltd.
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND ELECTRODE MEMBER
- Publication number 20200407840
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLACING TABLE AND PLASMA TREATMENT APPARATUS
- Publication number 20200266081
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20190348316
- Publication date Nov 14, 2019
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Verifying the Terms of Use for Access to a Service
- Publication number 20190294667
- Publication date Sep 26, 2019
- International Business Machines Corporation
- Taku Aratsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TECHNIQUE USED IN TEXT ANALYSIS IN A SAFE MANNER
- Publication number 20190042792
- Publication date Feb 7, 2019
- International Business Machines Corporation
- Daisuke Hayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180374672
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPLYING UPDATE TO SNAPSHOTS OF VIRTUAL MACHINE
- Publication number 20180232225
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Yuto Fukui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPLYING UPDATE TO SNAPSHOTS OF VIRTUAL MACHINE
- Publication number 20180225108
- Publication date Aug 9, 2018
- International Business Machines Corporation
- Yuto Fukui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLACING UNIT AND PLASMA PROCESSING APPARATUS
- Publication number 20180144945
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Tomoyuki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND PLASMA TREATMENT APPARATUS
- Publication number 20170140954
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE USED IN TEXT ANALYSIS IN A SAFE MANNER
- Publication number 20170124037
- Publication date May 4, 2017
- International Business Machines Corporation
- Daisuke Hayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEMPERATURE CONTROL APPARATUS, TEMPERATURE CONTROL METHOD AND RECOR...
- Publication number 20160302258
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPLYING UPDATE TO SNAPSHOTS OF VIRTUAL MACHINE
- Publication number 20160117163
- Publication date Apr 28, 2016
- International Business Machines Corporation
- Yuto Fukui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTROSTATIC CHUCK, PLACING TABLE, PLASMA PROCESSING APPARATUS, AN...
- Publication number 20150243541
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20150129134
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140352890
- Publication date Dec 4, 2014
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERIFYING THE TERMS OF USE FOR ACCESS TO A SERVICE
- Publication number 20140330553
- Publication date Nov 6, 2014
- International Business Machines Corporation
- Taku Aratsu
- G06 - COMPUTING CALCULATING COUNTING

Daisuke HAYASHI

Person

Patents Grantslast 30 patents

Amplification device and transmission/reception system

Substrate-floatation-type laser processing apparatus and method for...

Plasma processing apparatus

Stage and electrode member

Substrate support and plasma processing apparatus

Stage and plasma processing apparatus

Structure for automatic in-situ replacement of a part of an electro...

Placing table and plasma treatment apparatus

Stage and plasma processing apparatus

Stage and plasma processing apparatus

Plasma processing apparatus

Verifying the terms of use for access to a service

Technique used in text analysis in a safe manner

Placing table and plasma treatment apparatus

Applying update to snapshots of virtual machine

Verifying the terms of use for access to a service

Verifying the terms of use for access to a service

Temperature control apparatus, temperature control method and recor...

Mounting table and plasma processing apparatus

Plasma etching apparatus

Applying update to snapshots of virtual machine

Technique used in text analysis in a safe manner

Applying update to snapshots of virtual machine

Method of manufacturing electrostatic chuck having dot structure on...

Protecting confidential information

Protecting confidential information

Substrate processing apparatus

Gas shower structure and substrate processing apparatus

Generating an ordered list of managed targets

Bonding method, mounting table and substrate processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE-FLOATATION-TYPE LASER PROCESSING APPARATUS AND METHOD FOR...

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM

TRANSFER DEVICE, TRANSFER SYSTEM, AND END EFFECTOR

STRUCTURE FOR AUTOMATIC IN-SITU REPLACEMENT OF A PART OF AN ELECTRO...

DEVICE FOR SUPPORTING SUBSTRATE HAVING THERMAL EXPANSION COEFFICIENT

PLASMA PROCESSING APPARATUS

AMPLIFICATION DEVICE AND TRANSMISSION/RECEPTION SYSTEM

SUBSTRATE PROCESSING SYSTEM AND METHOD FOR REPLACING EDGE RING

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLA...

SUBSTRATE-FLOATATION-TYPE LASER PROCESSING APPARATUS AND METHOD FOR...

STAGE AND ELECTRODE MEMBER

PLACING TABLE AND PLASMA TREATMENT APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

Verifying the Terms of Use for Access to a Service

TECHNIQUE USED IN TEXT ANALYSIS IN A SAFE MANNER

PLASMA PROCESSING APPARATUS

APPLYING UPDATE TO SNAPSHOTS OF VIRTUAL MACHINE

APPLYING UPDATE TO SNAPSHOTS OF VIRTUAL MACHINE

PLACING UNIT AND PLASMA PROCESSING APPARATUS

PLACING TABLE AND PLASMA TREATMENT APPARATUS

TECHNIQUE USED IN TEXT ANALYSIS IN A SAFE MANNER

TEMPERATURE CONTROL APPARATUS, TEMPERATURE CONTROL METHOD AND RECOR...

APPLYING UPDATE TO SNAPSHOTS OF VIRTUAL MACHINE

ELECTROSTATIC CHUCK, PLACING TABLE, PLASMA PROCESSING APPARATUS, AN...

PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

VERIFYING THE TERMS OF USE FOR ACCESS TO A SERVICE