Daisuke Katayama

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,779,936
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Daisuke Katayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150162193
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Daisuke Katayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150093886
- Publication date Apr 2, 2015
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C30 - CRYSTAL GROWTH
Information Patent Application
CRYSTALLINE SILICON FILM FORMING METHOD AND PLASMA CVD APPARATUS
- Publication number 20120315745
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Daisuke Katayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MODIFYING INSULATING FILM WITH PLASMA
- Publication number 20110053381
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Takashi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS