Daisuke Kawana

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Alternating copolymer, method of producing alternating copolymer, m...
- Patent number 11,780,946
- Issue date Oct 10, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi Yamazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organically modified metal oxide nanoparticles, organically modifie...
- Patent number 11,747,724
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Kiwamu Sue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of producing block copolymer capable of creating specific st...
- Patent number 11,560,444
- Issue date Jan 24, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki Hayakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resin composition for forming phase-separated structure, method for...
- Patent number 11,472,956
- Issue date Oct 18, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki Hayakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Block copolymer and method of producing the same, and method of pro...
- Patent number 11,261,299
- Issue date Mar 1, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block copolymer, and method of producing structure containing phase...
- Patent number 10,941,253
- Issue date Mar 9, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki Hayakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,324,377
- Issue date Jun 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,101,658
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type resist composition, method for forming resist pattern...
- Patent number 9,766,541
- Issue date Sep 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for EUV or EB, and method of forming resist pattern
- Patent number 9,057,948
- Issue date Jun 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, acid generator, resist composition, and method of forming...
- Patent number 8,227,169
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition and method of forming pattern
- Patent number 8,216,763
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermoacid generator for antireflection film formation, composition...
- Patent number 7,785,768
- Issue date Aug 31, 2010
- Tokyo Ohka Kogyo Co. Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method for forming resist pattern
- Patent number 7,666,569
- Issue date Feb 23, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 7,416,832
- Issue date Aug 26, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lift-off positive resist composition
- Patent number 7,318,992
- Issue date Jan 15, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,261,994
- Issue date Aug 28, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Takayuki Hosono
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition and resist patterning meth...
- Patent number 6,787,290
- Issue date Sep 7, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220171286
- Publication date Jun 2, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takatoshi INARI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...
- Publication number 20220017741
- Publication date Jan 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki HAYAKAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, M...
- Publication number 20210230332
- Publication date Jul 29, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLES, ORGANICALLY MODIFIE...
- Publication number 20210191261
- Publication date Jun 24, 2021
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Kiwamu SUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING BLOCK COPOLYMER CAPABLE OF CREATING SPECIFIC ST...
- Publication number 20200262960
- Publication date Aug 20, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki HAYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BLOCK COPOLYMER AND METHOD OF PRODUCING THE SAME, AND METHOD OF PRO...
- Publication number 20190270852
- Publication date Sep 5, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BLOCK COPOLYMER, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE...
- Publication number 20180244856
- Publication date Aug 30, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki HAYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20160376233
- Publication date Dec 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160363860
- Publication date Dec 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160209745
- Publication date Jul 21, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
- Publication number 20140093824
- Publication date Apr 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130143159
- Publication date Jun 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...
- Publication number 20100104973
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20090311625
- Publication date Dec 17, 2009
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
- Publication number 20090220889
- Publication date Sep 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermoacid Generator for Antireflection Film Formation, Composition...
- Publication number 20090130595
- Publication date May 21, 2009
- TOKYO OHKA KOGYO CO., LTD.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE,...
- Publication number 20090068586
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAY...
- Publication number 20080312400
- Publication date Dec 18, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki YAMASHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20080227027
- Publication date Sep 18, 2008
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming antireflection coating
- Publication number 20070281098
- Publication date Dec 6, 2007
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20070141514
- Publication date Jun 21, 2007
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition, resist laminates and process for formi...
- Publication number 20070009828
- Publication date Jan 11, 2007
- Tokyo Ohka Kogyo, Co., LTD.
- Koki Tamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for formation of antireflection film, and antireflectio...
- Publication number 20060292488
- Publication date Dec 28, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and method for forming resist pattern
- Publication number 20060251986
- Publication date Nov 9, 2006
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silsesquioxane resin, positive resist composition,layered product i...
- Publication number 20060222866
- Publication date Oct 5, 2006
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming antireflection coating
- Publication number 20060021964
- Publication date Feb 2, 2006
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplification type silicone based positive photoresist com...
- Publication number 20060003252
- Publication date Jan 5, 2006
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming antireflection coating
- Publication number 20050282090
- Publication date Dec 22, 2005
- Kawasaki-shi Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20050266346
- Publication date Dec 1, 2005
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lift-off positive resist composition
- Publication number 20050227171
- Publication date Oct 13, 2005
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Daisuke Kawana

Person

Patents Grantslast 30 patents

Alternating copolymer, method of producing alternating copolymer, m...

Organically modified metal oxide nanoparticles, organically modifie...

Method of producing block copolymer capable of creating specific st...

Resin composition for forming phase-separated structure, method for...

Block copolymer and method of producing the same, and method of pro...

Block copolymer, and method of producing structure containing phase...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Positive-type resist composition, method for forming resist pattern...

Resist composition for EUV or EB, and method of forming resist pattern

Compound, acid generator, resist composition, and method of forming...

Photosensitive resin composition and method of forming pattern

Thermoacid generator for antireflection film formation, composition...

Positive resist composition and method for forming resist pattern

Positive resist composition

Lift-off positive resist composition

Positive resist composition

Positive-working photoresist composition and resist patterning meth...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...

ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, M...

ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLES, ORGANICALLY MODIFIE...

METHOD OF PRODUCING BLOCK COPOLYMER CAPABLE OF CREATING SPECIFIC ST...

BLOCK COPOLYMER AND METHOD OF PRODUCING THE SAME, AND METHOD OF PRO...

BLOCK COPOLYMER, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE...

POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN

COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...

Method for forming photoresist pattern and photoresist laminate

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN

Thermoacid Generator for Antireflection Film Formation, Composition...

SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE,...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAY...

Method for forming photoresist pattern and photoresist laminate

Composition for forming antireflection coating

Method for forming photoresist pattern and photoresist laminate

Positive resist composition, resist laminates and process for formi...

Composition for formation of antireflection film, and antireflectio...

Positive resist composition and method for forming resist pattern

Silsesquioxane resin, positive resist composition,layered product i...

Composition for forming antireflection coating

Chemical amplification type silicone based positive photoresist com...

Composition for forming antireflection coating

Method for forming photoresist pattern and photoresist laminate

Lift-off positive resist composition