Daisuke YOSHIMUNE

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Fukushima, JP

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Patents Applicationslast 30 patents

Information Patent Application
GLASS SUBSTRATE FOR EUVL, AND MASK BLANK FOR EUVL
- Publication number 20220137500
- Publication date May 5, 2022
- AGC Inc.
- Daisuke YOSHIMUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GLASS SUBSTRATE FOR EUVL, AND MASK BLANK FOR EUVL
- Publication number 20220137504
- Publication date May 5, 2022
- AGC Inc.
- Daisuke YOSHIMUNE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY