Daita Kouno

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for formation of upper layer film, and method for forma...
- Patent number 8,895,229
- Issue date Nov 25, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,697,344
- Issue date Apr 15, 2014
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer film forming composition and method of forming photores...
- Patent number 8,507,189
- Issue date Aug 13, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer-forming composition and photoresist patterning method
- Patent number 8,435,718
- Issue date May 7, 2013
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,431,332
- Issue date Apr 30, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer-forming composition and photoresist patterning method
- Patent number 8,076,053
- Issue date Dec 13, 2011
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20130216961
- Publication date Aug 22, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD
- Publication number 20120028198
- Publication date Feb 2, 2012
- JSR Corporation
- Atsushi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20100255416
- Publication date Oct 7, 2010
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORES...
- Publication number 20100040974
- Publication date Feb 18, 2010
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMA...
- Publication number 20100021852
- Publication date Jan 28, 2010
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD
- Publication number 20100003615
- Publication date Jan 7, 2010
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Daita Kouno

Person

Patents Grantslast 30 patents

Composition for formation of upper layer film, and method for forma...

Composition for forming upper layer film for immersion exposure, up...

Upper layer film forming composition and method of forming photores...

Upper layer-forming composition and photoresist patterning method

Composition for forming upper layer film for immersion exposure, up...

Upper layer-forming composition and photoresist patterning method

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORES...

COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMA...

UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD