Daksh Agarwal

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Delayed pulsing for plasma processing of wafers
- Patent number 11,817,312
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Akhil Mehrotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV resist patterning using pulsed plasma
- Patent number 10,847,368
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO CONTROL ETCH PROFILE BY RF PULSING
- Publication number 20250095964
- Publication date Mar 20, 2025
- LAM RESEARCH CORPORATION
- Daksh AGARWAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCH WITH ORGANOCHLORIDE
- Publication number 20240429063
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Ilya PISKUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS
- Publication number 20240047195
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- AKHIL MEHROTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF MASK CD
- Publication number 20230230807
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Beibei Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS
- Publication number 20200135458
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- AKHIL MEHROTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST PATTERNING USING PULSED PLASMA
- Publication number 20180292756
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Byungkook Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY