Damian Fiolka

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 10,151,982
- Issue date Dec 11, 2018
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 10,146,135
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,933,706
- Issue date Apr 3, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,897,925
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography illumination system and microlithography illuminat...
- Patent number 9,778,576
- Issue date Oct 3, 2017
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV microlithography projection exposure apparatus with a heat ligh...
- Patent number 9,588,435
- Issue date Mar 7, 2017
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization-modulating optical element
- Patent number 9,581,911
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization-modulating optical element
- Patent number 9,470,982
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,454,085
- Issue date Sep 27, 2016
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G02 - OPTICS
Information Patent Grant
Liquid cooled EUV reflector
- Patent number 9,423,590
- Issue date Aug 23, 2016
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Grant
Optical system for semiconductor lithography
- Patent number 9,383,544
- Issue date Jul 5, 2016
- Carl Zeiss SMT GmbH
- Frank Melzer
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,316,920
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Producing polarization-modulating optical element for microlithogra...
- Patent number 9,316,772
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Microlithography illumination system and microlithography illuminat...
- Patent number 9,304,405
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for EUV microlithography
- Patent number 9,304,400
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Illumination system or projection objective of a microlithographic...
- Patent number 9,274,435
- Issue date Mar 1, 2016
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,239,229
- Issue date Jan 19, 2016
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Illumination optical unit for microlithography
- Patent number 9,235,137
- Issue date Jan 12, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Optical system and multi facet mirror of a microlithographic projec...
- Patent number 9,213,245
- Issue date Dec 15, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,170,499
- Issue date Oct 27, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Method for modifying a polarization distribution in microlithograph...
- Patent number 9,128,389
- Issue date Sep 8, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,091,945
- Issue date Jul 28, 2015
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G02 - OPTICS
Information Patent Grant
Optical element having a plurality of reflective facet elements
- Patent number 9,063,336
- Issue date Jun 23, 2015
- Carl Zeiss SMT GmbH
- Marc Kirch
- G02 - OPTICS
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,019,475
- Issue date Apr 28, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,013,680
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,013,684
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,001,309
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Optical assembly
- Patent number 8,964,162
- Issue date Feb 24, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,928,859
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,891,057
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20190094704
- Publication date Mar 28, 2019
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20180314165
- Publication date Nov 1, 2018
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20180246415
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Stefan Xalter
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20170329233
- Publication date Nov 16, 2017
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20170261861
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20170102622
- Publication date Apr 13, 2017
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20160266502
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20160195815
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...
- Publication number 20160195820
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20150300807
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150286150
- Publication date Oct 8, 2015
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...
- Publication number 20150177623
- Publication date Jun 25, 2015
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150153654
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140233006
- Publication date Aug 21, 2014
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140226141
- Publication date Aug 14, 2014
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140211188
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
PRODUCING POLARIZATION-MODULATING OPTICAL ELEMENT FOR MICROLITHOGRA...
- Publication number 20140102355
- Publication date Apr 17, 2014
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT
- Publication number 20140071523
- Publication date Mar 13, 2014
- Joachim Hartjes
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20130293862
- Publication date Nov 7, 2013
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION
- Publication number 20130278913
- Publication date Oct 24, 2013
- Manfred Maul
- G02 - OPTICS
Information Patent Application
EUV microlithography projection exposure apparatus with a heat ligh...
- Publication number 20130222780
- Publication date Aug 29, 2013
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS FOR MICROLITHOGRAPHY PROJECTION SYSTEM INCLU...
- Publication number 20130222778
- Publication date Aug 29, 2013
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
Illumination optical unit with a movable filter element
- Publication number 20130176546
- Publication date Jul 11, 2013
- Carl Zeiss SMT GMBH
- Michael Layh
- F21 - LIGHTING
Information Patent Application
OPTICAL SYSTEM AND MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJEC...
- Publication number 20130100429
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20130021591
- Publication date Jan 24, 2013
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20120327385
- Publication date Dec 27, 2012
- Carl Zeiss SMT GMBH
- Frank Melzer
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20120293784
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS
- Publication number 20120293785
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Marc Kirch
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120293786
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
FACET MIRROR FOR USE IN MICROLITHOGRAPHY
- Publication number 20120287414
- Publication date Nov 15, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS

Damian Fiolka

Person

Patents Grantslast 30 patents

Illumination system of a microlithographic projection exposure appa...

Microlithographic projection exposure apparatus having a multi-mirr...

Illumination system of a microlithographic projection exposure appa...

Method and device for monitoring multiple mirror arrays in an illum...

Microlithography illumination system and microlithography illuminat...

EUV microlithography projection exposure apparatus with a heat ligh...

Polarization-modulating optical element

Polarization-modulating optical element

Illumination system of a microlithographic projection exposure appa...

Liquid cooled EUV reflector

Optical system for semiconductor lithography

Illumination system of a microlithographic projection exposure appa...

Producing polarization-modulating optical element for microlithogra...

Microlithography illumination system and microlithography illuminat...

Illumination system for EUV microlithography

Illumination system or projection objective of a microlithographic...

Method and device for monitoring multiple mirror arrays in an illum...

Illumination optical unit for microlithography

Optical system and multi facet mirror of a microlithographic projec...

Illumination system of a microlithographic projection exposure appa...

Method for modifying a polarization distribution in microlithograph...

Illumination system of a microlithographic projection exposure appa...

Optical element having a plurality of reflective facet elements

Method and device for monitoring multiple mirror arrays in an illum...

Illumination system of a microlithographic projection exposure appa...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Optical assembly

Illumination system of a microlithographic projection exposure appa...

Microlithographic projection exposure apparatus

Patents Applicationslast 30 patents

POLARIZATION-MODULATING OPTICAL ELEMENT

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

POLARIZATION-MODULATING OPTICAL ELEMENT

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

POLARIZATION-MODULATING OPTICAL ELEMENT

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PRODUCING POLARIZATION-MODULATING OPTICAL ELEMENT FOR MICROLITHOGRA...

OPTICAL ELEMENT

POLARIZATION-MODULATING OPTICAL ELEMENT

FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION

EUV microlithography projection exposure apparatus with a heat ligh...

ILLUMINATION APPARATUS FOR MICROLITHOGRAPHY PROJECTION SYSTEM INCLU...

Illumination optical unit with a movable filter element

OPTICAL SYSTEM AND MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJEC...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

FACET MIRROR FOR USE IN MICROLITHOGRAPHY