Dan Wack

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical etendue matching methods for extreme ultraviolet metrology
- Patent number 11,968,772
- Issue date Apr 23, 2024
- KLA Corporation
- Zefram Marks
- G01 - MEASURING TESTING
Information Patent Grant
Fast phase-shift interferometry by laser frequency shift
- Patent number 11,469,571
- Issue date Oct 11, 2022
- KLA Corporation
- Haifeng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for semiconductor metrology based on polychroma...
- Patent number 11,333,621
- Issue date May 17, 2022
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Common path mode fiber tip diffraction interferometer for wavefront...
- Patent number 11,333,487
- Issue date May 17, 2022
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system with non-circular pupil
- Patent number 11,112,691
- Issue date Sep 7, 2021
- KLA Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral reflectometry for in-situ process monitoring and control
- Patent number 10,438,825
- Issue date Oct 8, 2019
- KLA-Tencor Corporation
- Prateek Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle and chemical control using tunnel flow
- Patent number 9,759,912
- Issue date Sep 12, 2017
- KLA-Tencor Corporation
- Frank Chilese
- G02 - OPTICS
Information Patent Grant
Apparatus for measuring overlay errors
- Patent number 9,702,693
- Issue date Jul 11, 2017
- KLA-Tencor Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source multiplexing illumination for mask inspection
- Patent number 9,625,810
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for generation of extreme ultraviolet light
- Patent number 9,544,984
- Issue date Jan 10, 2017
- KLA-Tencor Corporation
- Alexander Bykanov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser-produced plasma EUV source with reduced debris generation uti...
- Patent number 9,335,637
- Issue date May 10, 2016
- KLA-Tencor Corporation
- Gildardo Delgado
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source using cryogenic droplet targets in mask inspection
- Patent number 9,295,147
- Issue date Mar 22, 2016
- KLA-Tencor Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Temperature control in EUV reticle inspection tool
- Patent number 9,164,388
- Issue date Oct 20, 2015
- KLA-Tencor Corporation
- Frank Chilese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase grating for mask inspection system
- Patent number 9,151,881
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Optical characterization systems employing compact synchrotron radi...
- Patent number 8,941,336
- Issue date Jan 27, 2015
- KLA-Tencor Corporation
- Yanwei Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiplexing EUV sources in reticle inspection
- Patent number 8,917,432
- Issue date Dec 23, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS
Information Patent Grant
Apparatus for EUV imaging and methods of using same
- Patent number 8,842,272
- Issue date Sep 23, 2014
- KLA-Tencor Corporation
- Daniel C. Wack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring critical dimensions of a semiconductor structure
- Patent number 8,798,966
- Issue date Aug 5, 2014
- KLA-Tencor Corporation
- John Hench
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for synchronizing sample stage motion with a t...
- Patent number 8,772,731
- Issue date Jul 8, 2014
- KLA-Tencor Corporation
- Pradeep Subrahmanyan
- G01 - MEASURING TESTING
Information Patent Grant
Optical characterization systems employing compact synchrotron radi...
- Patent number 8,749,179
- Issue date Jun 10, 2014
- KLA-Tencor Corporation
- Yanwei Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and systems for determining a critical dimension and overla...
- Patent number 8,502,979
- Issue date Aug 6, 2013
- KLA-Tencor Technologies Corp.
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Grant
Overlay marks, methods of overlay mark design and methods of overla...
- Patent number 8,330,281
- Issue date Dec 11, 2012
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for determining a critical dimension and overla...
- Patent number 8,179,530
- Issue date May 15, 2012
- KLA-Tencor Technologies Corp.
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Grant
Bright and dark field scatterometry systems for line roughness metr...
- Patent number 8,045,179
- Issue date Oct 25, 2011
- KLA-Tencor Corporation
- Guorong Vera Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Measurement and control of strained devices
- Patent number 7,951,672
- Issue date May 31, 2011
- KLA-Tencor Corporation
- Daniel C. Wack
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,933,016
- Issue date Apr 26, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Overlay marks and methods of manufacturing such marks
- Patent number 7,879,627
- Issue date Feb 1, 2011
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement and control of strained devices
- Patent number 7,838,309
- Issue date Nov 23, 2010
- KLA-Tencor Corporation
- Daniel C. Wack
- G01 - MEASURING TESTING
Information Patent Grant
Parametric profiling using optical spectroscopic systems
- Patent number 7,826,071
- Issue date Nov 2, 2010
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Method for optimizing the configuration of a scatterometry measurem...
- Patent number 7,826,072
- Issue date Nov 2, 2010
- KLA-Tencor Technologies Corporation
- Daniel C. Wack
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
FAST PHASE-SHIFT INTERFEROMETRY BY LASER FREQUENCY SHIFT
- Publication number 20210159667
- Publication date May 27, 2021
- KLA Corporation
- Haifeng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMMON PATH MODE FIBER TIP DIFFRACTION INTERFEROMETER FOR WAVEFRONT...
- Publication number 20210123716
- Publication date Apr 29, 2021
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
Optical Etendue Matching Methods for Extreme Ultraviolet Metrology
- Publication number 20200383200
- Publication date Dec 3, 2020
- KLA Corporation
- Zefram Marks
- G02 - OPTICS
Information Patent Application
Inspection System with Non-Circular Pupil
- Publication number 20200225574
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods And Systems For Semiconductor Metrology Based On Polychroma...
- Publication number 20190017946
- Publication date Jan 17, 2019
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spectral Reflectometry For In-Situ Process Monitoring And Control
- Publication number 20180061691
- Publication date Mar 1, 2018
- KLA-Tencor Corporation
- Prateek Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MEASURING OVERLAY ERRORS
- Publication number 20160313116
- Publication date Oct 27, 2016
- KLA-Tencor Corporation
- Mark Ghinovker
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Generation of Extreme Ultraviolet Light
- Publication number 20150076359
- Publication date Mar 19, 2015
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
EUV LIGHT SOURCE USING CRYOGENIC DROPLET TARGETS IN MASK INSPECTION
- Publication number 20140246607
- Publication date Sep 4, 2014
- KLA-Tencor Corporation
- Alexander Bykanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Phase Grating For Mask Inspection System
- Publication number 20140131586
- Publication date May 15, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G02 - OPTICS
Information Patent Application
PARTICLE AND CHEMICAL CONTROL USING TUNNEL FLOW
- Publication number 20140085724
- Publication date Mar 27, 2014
- Frank Chilese
- G02 - OPTICS
Information Patent Application
Optical Characterization Systems Employing Compact Synchrotron Radi...
- Publication number 20140048707
- Publication date Feb 20, 2014
- KLA-Tencor Corporation
- Yanwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION
- Publication number 20140036333
- Publication date Feb 6, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS
Information Patent Application
Methods and Systems for Determining a Critical Dimension and Overla...
- Publication number 20130314710
- Publication date Nov 28, 2013
- KLA-Tencor Technologies Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A T...
- Publication number 20130270444
- Publication date Oct 17, 2013
- KLA-Tencor Corporation
- Pradeep Subrahmanyan
- G01 - MEASURING TESTING
Information Patent Application
TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL
- Publication number 20130265557
- Publication date Oct 10, 2013
- KLA-Tencor Corporation
- Frank Chilese
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR EUV IMAGING AND METHODS OF USING SAME
- Publication number 20130083321
- Publication date Apr 4, 2013
- KLA-Tencor Corporation
- Daniel C. Wack
- B82 - NANO-TECHNOLOGY
Information Patent Application
LASER-PRODUCED PLASMA EUV SOURCE WITH REDUCED DEBRIS GENERATION
- Publication number 20130063803
- Publication date Mar 14, 2013
- KLA-Tencor Corporation
- Gildardo Delgado
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...
- Publication number 20130039460
- Publication date Feb 14, 2013
- KLA-Tencor Technologies Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods for Determining One or More Characteristics of...
- Publication number 20120281275
- Publication date Nov 8, 2012
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION
- Publication number 20120236281
- Publication date Sep 20, 2012
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measurement and control of strained devices
- Publication number 20110027919
- Publication date Feb 3, 2011
- KLA-Tencor Corporation
- Daniel C. Wack
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATT...
- Publication number 20100279213
- Publication date Nov 4, 2010
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...
- Publication number 20100271621
- Publication date Oct 28, 2010
- KLA-Tencor Technologies Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF...
- Publication number 20100235114
- Publication date Sep 16, 2010
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20100091284
- Publication date Apr 15, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MARKS, METHODS OF OVERLAY MARK DESIGN AND METHODS OF OVERLA...
- Publication number 20090291513
- Publication date Nov 26, 2009
- KLA-Tencor Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM FOR SCATTEROMETRIC MEASUREMENTS AND APPLICATIONS
- Publication number 20090195779
- Publication date Aug 6, 2009
- Anatoly Fabrikant
- G02 - OPTICS
Information Patent Application
SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DI...
- Publication number 20090190141
- Publication date Jul 30, 2009
- KLA-Tencor Technologies Corporation
- Noah Bareket
- G01 - MEASURING TESTING
Information Patent Application
Parametric Profiling Using Optical Spectroscopic Systems
- Publication number 20090135416
- Publication date May 28, 2009
- KLA-Tencor Technologies Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Optical etendue matching methods for extreme ultraviolet metrology

Fast phase-shift interferometry by laser frequency shift

Methods and systems for semiconductor metrology based on polychroma...

Common path mode fiber tip diffraction interferometer for wavefront...

Inspection system with non-circular pupil

Spectral reflectometry for in-situ process monitoring and control

Particle and chemical control using tunnel flow

Apparatus for measuring overlay errors

Source multiplexing illumination for mask inspection

System and method for generation of extreme ultraviolet light

Laser-produced plasma EUV source with reduced debris generation uti...

EUV light source using cryogenic droplet targets in mask inspection

Temperature control in EUV reticle inspection tool

Phase grating for mask inspection system

Optical characterization systems employing compact synchrotron radi...

Multiplexing EUV sources in reticle inspection

Apparatus for EUV imaging and methods of using same

Measuring critical dimensions of a semiconductor structure

Apparatus and method for synchronizing sample stage motion with a t...

Optical characterization systems employing compact synchrotron radi...

Methods and systems for determining a critical dimension and overla...

Overlay marks, methods of overlay mark design and methods of overla...

Methods and systems for determining a critical dimension and overla...

Bright and dark field scatterometry systems for line roughness metr...

Measurement and control of strained devices

Apparatus and methods for detecting overlay errors using scatterometry

Overlay marks and methods of manufacturing such marks

Measurement and control of strained devices

Parametric profiling using optical spectroscopic systems

Method for optimizing the configuration of a scatterometry measurem...

Patents Applicationslast 30 patents

FAST PHASE-SHIFT INTERFEROMETRY BY LASER FREQUENCY SHIFT

COMMON PATH MODE FIBER TIP DIFFRACTION INTERFEROMETER FOR WAVEFRONT...

Optical Etendue Matching Methods for Extreme Ultraviolet Metrology

Inspection System with Non-Circular Pupil

Methods And Systems For Semiconductor Metrology Based On Polychroma...

Spectral Reflectometry For In-Situ Process Monitoring And Control

APPARATUS FOR MEASURING OVERLAY ERRORS

System and Method for Generation of Extreme Ultraviolet Light

EUV LIGHT SOURCE USING CRYOGENIC DROPLET TARGETS IN MASK INSPECTION

Phase Grating For Mask Inspection System

PARTICLE AND CHEMICAL CONTROL USING TUNNEL FLOW

Optical Characterization Systems Employing Compact Synchrotron Radi...

MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION

Methods and Systems for Determining a Critical Dimension and Overla...

APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A T...

TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL

APPARATUS FOR EUV IMAGING AND METHODS OF USING SAME

LASER-PRODUCED PLASMA EUV SOURCE WITH REDUCED DEBRIS GENERATION

METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...

Systems and Methods for Determining One or More Characteristics of...

SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION

Measurement and control of strained devices

METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATT...

METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...

SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF...

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

OVERLAY MARKS, METHODS OF OVERLAY MARK DESIGN AND METHODS OF OVERLA...

SYSTEM FOR SCATTEROMETRIC MEASUREMENTS AND APPLICATIONS

SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DI...

Parametric Profiling Using Optical Spectroscopic Systems