Dana L. Durham

Person

Flemington, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for stripping photoresist and organic materials from su...
- Patent number 6,368,421
- Issue date Apr 9, 2002
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating for photoresist compositions
- Patent number 6,187,506
- Issue date Feb 13, 2001
- Clariant Finance (BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating material for photoresists
- Patent number 6,106,995
- Issue date Aug 22, 2000
- Clariant Finance (BVI) Limited
- Sunit S. Dixit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions for photoresist compositions an...
- Patent number 5,994,430
- Issue date Nov 30, 1999
- Clariant Finance BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light absorbing polymers
- Patent number 5,981,145
- Issue date Nov 9, 1999
- Clariant Finance (BVI) Limited
- Shuji Ding
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresists containing novel photoactive compounds
- Patent number 5,876,897
- Issue date Mar 2, 1999
- Clariant Finance (BVI) Limited
- Dana L. Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive quinolone compounds and a process of preparation
- Patent number 5,866,295
- Issue date Feb 2, 1999
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Antireflective coating for photoresist compositions
- Patent number 5,733,714
- Issue date Mar 31, 1998
- Clariant Finance (BVI) Limited
- Iain McCulloch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using a Lewis base to control molecular weight of novolak...
- Patent number 5,688,893
- Issue date Nov 18, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acidic ion exchange resin as a catalyst to synthesize a novolak res...
- Patent number 5,665,517
- Issue date Sep 9, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous antireflective coatings for photoresist compositions
- Patent number 5,652,297
- Issue date Jul 29, 1997
- Hoechst Celanese Corporation
- Iain McCulloch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective coatings for photoresist compositions
- Patent number 5,652,317
- Issue date Jul 29, 1997
- Hoechst Celanese Corporation
- Iain McCulloch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolak resin blends for photoresist applications
- Patent number 5,646,218
- Issue date Jul 8, 1997
- Hoechst Celanese Corp.
- Thomas J. Lynch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in top anti-reflective coatings for photoresisis
- Patent number 5,624,789
- Issue date Apr 29, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using a Lewis base to control molecular weight of novolak resins
- Patent number 5,614,349
- Issue date Mar 25, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in novolak resins and photoresists
- Patent number 5,594,098
- Issue date Jan 14, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in novolak resins and photoresists
- Patent number 5,580,949
- Issue date Dec 3, 1996
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist having a low level of metal ions
- Patent number 5,543,263
- Issue date Aug 6, 1996
- Hoechst Celanese Corporation
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal ion reduction in top anti-reflective coatings for photoresists
- Patent number 5,516,886
- Issue date May 14, 1996
- Hoechst Celanese Corporation
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal ion reduction in the raw materials and using a Lewis base to...
- Patent number 5,476,750
- Issue date Dec 19, 1995
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Image reversal negative working photoresist containing O-quinone di...
- Patent number 5,399,456
- Issue date Mar 21, 1995
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin blends for photoresist applications
- Patent number 5,374,693
- Issue date Dec 20, 1994
- Hoechst Celanese Corporation
- Thomas J. Lynch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing a developer having a low metal ion level
- Patent number 5,286,606
- Issue date Feb 15, 1994
- Hoechst Celanese Corporation
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reversal negative working O-naphthoquinone diazide and cross-...
- Patent number 5,256,522
- Issue date Oct 26, 1993
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyphosphazene binder resins for photoresists comprising as photos...
- Patent number 5,248,585
- Issue date Sep 28, 1993
- Hoechst Celanese Corporation
- Thomas J. Lynch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Image reversal negative working o-quinone diazide and cross-linking...
- Patent number 5,217,840
- Issue date Jun 8, 1993
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist containing a mixture of propylene glycol alkyl...
- Patent number 5,039,594
- Issue date Aug 13, 1991
- Hoechst Celanese Corporation
- Dana Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing an image reversal negative photoresist having a...
- Patent number 5,019,488
- Issue date May 28, 1991
- Hoechst Celanese Corporation
- Donald C. Mammato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist treating composition consisting of a mixture of propyle...
- Patent number 4,983,490
- Issue date Jan 8, 1991
- Hoechst Celanese Corporation
- Dana Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist with a solvent mixture of propylene glycol alk...
- Patent number 4,948,697
- Issue date Aug 14, 1990
- Hoechst Celanese Corporation
- Dana Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Dana L. Durham

Person

Patents Grantslast 30 patents

Composition for stripping photoresist and organic materials from su...

Antireflective coating for photoresist compositions

Antireflective coating material for photoresists

Antireflective coating compositions for photoresist compositions an...

Light absorbing polymers

Positive photoresists containing novel photoactive compounds

Photosensitive quinolone compounds and a process of preparation

Antireflective coating for photoresist compositions

Method of using a Lewis base to control molecular weight of novolak...

Acidic ion exchange resin as a catalyst to synthesize a novolak res...

Aqueous antireflective coatings for photoresist compositions

Antireflective coatings for photoresist compositions

Novolak resin blends for photoresist applications

Metal ion reduction in top anti-reflective coatings for photoresisis

Using a Lewis base to control molecular weight of novolak resins

Metal ion reduction in novolak resins and photoresists

Metal ion reduction in novolak resins and photoresists

Photoresist having a low level of metal ions

Metal ion reduction in top anti-reflective coatings for photoresists

Metal ion reduction in the raw materials and using a Lewis base to...

Image reversal negative working photoresist containing O-quinone di...

Novolak resin blends for photoresist applications

Process for producing a developer having a low metal ion level

Image reversal negative working O-naphthoquinone diazide and cross-...

Polyphosphazene binder resins for photoresists comprising as photos...

Image reversal negative working o-quinone diazide and cross-linking...

Positive photoresist containing a mixture of propylene glycol alkyl...

Method of producing an image reversal negative photoresist having a...

Photoresist treating composition consisting of a mixture of propyle...

Positive photoresist with a solvent mixture of propylene glycol alk...