Daniel Distaso

Person

Merrimac, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for variable etch depths
- Patent number 11,456,205
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with electrically floating power supply
- Patent number 10,904,996
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Travis Lee Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 10,290,470
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective processing of a workpiece
- Patent number 10,081,861
- Issue date Sep 25, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 9,734,991
- Issue date Aug 15, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for dynamic control of ion beam energy and angle
- Patent number 9,336,998
- Issue date May 10, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques for treating sidewalls of patterned structures using ang...
- Patent number 9,118,001
- Issue date Aug 25, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small form factor plasma source for high density wide ribbon ion be...
- Patent number 8,590,485
- Issue date Nov 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Using beam blockers to perform a patterned implant of a workpiece
- Patent number 8,461,556
- Issue date Jun 11, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for charge neutralization during processing of...
- Patent number 8,461,554
- Issue date Jun 11, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Monitoring plasma ion implantation systems for fault detection and...
- Patent number 7,878,145
- Issue date Feb 1, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Indirectly heated cathode ion source
- Patent number 7,138,768
- Issue date Nov 21, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Peter E. Maciejowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for indirectly heated cathode ion source
- Patent number 6,777,686
- Issue date Aug 17, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR VARIABLE ETCH DEPTHS
- Publication number 20210351069
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH ELECTRICALLY FLOATING POWER SUPPLY
- Publication number 20190090338
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Travis Lee KOH
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Negative Ribbon Ion Beams from Pulsed Plasmas
- Publication number 20170309454
- Publication date Oct 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Ribbon Ion Beams from Pulsed Plasmas
- Publication number 20170032937
- Publication date Feb 2, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Processing Of A Workpiece
- Publication number 20160298229
- Publication date Oct 13, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Workpiece Processing Method And Apparatus
- Publication number 20160111254
- Publication date Apr 21, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR DYNAMIC CONTROL OF ION BEAM ENERGY AND ANGLE
- Publication number 20150325410
- Publication date Nov 12, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR TREATING SIDEWALLS OF PATTERNED STRUCTURES USING ANG...
- Publication number 20140017817
- Publication date Jan 16, 2014
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CHARGE NEUTRALIZATION DURING PROCESSING OF...
- Publication number 20130146790
- Publication date Jun 13, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
UNIFORMITY CONTROL USING ION BEAM BLOCKERS
- Publication number 20120056107
- Publication date Mar 8, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Daniel DISTASO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING BEAM BLOCKERS TO PERFORM A PATTERNED IMPLANT OF A WORKPIECE
- Publication number 20120056110
- Publication date Mar 8, 2012
- VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATED, INC.
- Daniel DISTASO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMALL FORM FACTOR PLASMA SOURCE FOR HIGH DENSITY WIDE RIBBON ION BE...
- Publication number 20110259269
- Publication date Oct 27, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma Doping System with In-Situ Chamber Condition Monitoring
- Publication number 20090104719
- Publication date Apr 23, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE
- Publication number 20080245957
- Publication date Oct 9, 2008
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monitoring plasma ion implantation systems for fault detection and...
- Publication number 20080026133
- Publication date Jan 31, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Indirectly heated cathode ion source
- Publication number 20030218428
- Publication date Nov 27, 2003
- Peter E. Maciejowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control system for indirectly heated cathode ion source
- Publication number 20010042836
- Publication date Nov 22, 2001
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS

Daniel Distaso

Person

Patents Grantslast 30 patents

Methods for variable etch depths

Substrate support with electrically floating power supply

Negative ribbon ion beams from pulsed plasmas

Selective processing of a workpiece

Negative ribbon ion beams from pulsed plasmas

Apparatus and method for dynamic control of ion beam energy and angle

Techniques for treating sidewalls of patterned structures using ang...

Small form factor plasma source for high density wide ribbon ion be...

Using beam blockers to perform a patterned implant of a workpiece

Apparatus and method for charge neutralization during processing of...

Monitoring plasma ion implantation systems for fault detection and...

Indirectly heated cathode ion source

Control system for indirectly heated cathode ion source

Patents Applicationslast 30 patents

METHODS FOR VARIABLE ETCH DEPTHS

SUBSTRATE SUPPORT WITH ELECTRICALLY FLOATING POWER SUPPLY

Negative Ribbon Ion Beams from Pulsed Plasmas

Negative Ribbon Ion Beams from Pulsed Plasmas

Selective Processing Of A Workpiece

Workpiece Processing Method And Apparatus

APPARATUS AND METHOD FOR DYNAMIC CONTROL OF ION BEAM ENERGY AND ANGLE

TECHNIQUES FOR TREATING SIDEWALLS OF PATTERNED STRUCTURES USING ANG...

APPARATUS AND METHOD FOR CHARGE NEUTRALIZATION DURING PROCESSING OF...

UNIFORMITY CONTROL USING ION BEAM BLOCKERS

USING BEAM BLOCKERS TO PERFORM A PATTERNED IMPLANT OF A WORKPIECE

SMALL FORM FACTOR PLASMA SOURCE FOR HIGH DENSITY WIDE RIBBON ION BE...

Plasma Doping System with In-Situ Chamber Condition Monitoring

TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE

Monitoring plasma ion implantation systems for fault detection and...

Indirectly heated cathode ion source

Control system for indirectly heated cathode ion source