Daniel Durado

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Kalispell, MT, US

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Patents Grantslast 30 patents

Information Patent Grant
Plating systems having reduced air entrainment
- Patent number 11,739,434
- Issue date Aug 29, 2023
- Applied Materials, Inc.
- Cameron Law
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Semiconductor processor opening and closure construction
- Patent number 5,575,641
- Issue date Nov 19, 1996
- Semitool, Inc.
- Aleksander Owczarz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processor opening and closure construction
- Patent number 5,449,289
- Issue date Sep 12, 1995
- Semitool, Inc.
- Aleksander Owczarz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Door assembly for semiconductor processor
- Patent number 5,302,120
- Issue date Apr 12, 1994
- Semitool, Inc.
- Daniel L. Durado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for single wafer processing in which a semiconductor wafer i...
- Patent number 5,230,743
- Issue date Jul 27, 1993
- Semitool, Inc.
- Raymon F. Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer processor
- Patent number 5,224,504
- Issue date Jul 6, 1993
- Semitool, Inc.
- Raymon F. Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer processor
- Patent number 5,168,886
- Issue date Dec 8, 1992
- Semitool, Inc.
- Raymon F. Thompson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLATING SYSTEMS HAVING REDUCED AIR ENTRAINMENT
- Publication number 20230349064
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- Cameron Law
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PLATING SYSTEMS HAVING REDUCED AIR ENTRAINMENT
- Publication number 20200152467
- Publication date May 14, 2020
- Applied Materials, Inc.
- Cameron Law
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR