Daniel Fulford

Person

Meridian, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Precision multi-axis photolithography alignment correction using st...
- Patent number 12,001,147
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Daniel J. Fulford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 11,994,807
- Issue date May 28, 2024
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for tuning stress transitions of films on a substrate
- Patent number 11,990,334
- Issue date May 21, 2024
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for backside deposition of a substrate
- Patent number 11,908,728
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for liquid dispense and coverage control
- Patent number 11,883,837
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for pattern reduction using a staircase spacer
- Patent number 11,854,806
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a narrow trench
- Patent number 11,841,617
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Anton J. Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for pattern reduction using a staircase spacer
- Patent number 11,776,812
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress regions for three-dimension chiplet formation
- Patent number 11,721,551
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Anton J. Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress regions for three-dimension chiplet formation
- Patent number 11,688,642
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Anton J. Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling semiconductor film thickness
- Patent number 11,656,550
- Issue date May 23, 2023
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for planarization of organic films
- Patent number 11,393,694
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Anton Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for planarization of spin-on and CVD-deposited organic films
- Patent number 11,335,566
- Issue date May 17, 2022
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for layer by layer growth of conformal films
- Patent number 11,201,051
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increasing pattern density on a wafer
- Patent number 10,923,363
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Sanjana Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Location-specific tuning of stress to control bow to control overla...
- Patent number 10,453,692
- Issue date Oct 22, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Location-specific tuning of stress to control bow to control overla...
- Patent number 10,431,468
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for shifting critical dimensions of patterned films
- Patent number 9,977,339
- Issue date May 22, 2018
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate tuning system and method using optical projection
- Patent number 9,735,067
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for treating a substrate by optical projection of a correct...
- Patent number 9,646,898
- Issue date May 9, 2017
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
THREE-DIMENSIONAL MULTIPLE LOCATION COMPRESSING BONDED ARM-POISEDON...
- Publication number 20240203797
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Andrew WELOTH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...
- Publication number 20240201601
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Andrew WELOTH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE
- Publication number 20240194516
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and Method for Liquid Dispense and Coverage Control
- Publication number 20240042472
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Mirko VUKOVIC
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...
- Publication number 20230359128
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Andrew WELOTH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHUCK COMPENSATION VIA WAFER SHAPE CONTROL
- Publication number 20230326738
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Anthony R. SCHEPIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...
- Publication number 20230251584
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Daniel J. FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR...
- Publication number 20230251574
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Anthony R. SCHEPIS
- G01 - MEASURING TESTING
Information Patent Application
PRECISION MULTI-AXIS PHOTOLITHOGRAPHY ALIGNMENT CORRECTION USING ST...
- Publication number 20230161267
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Daniel J. FULFORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Forming Patterns
- Publication number 20230052800
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS REGIONS FOR THREE-DIMENSION CHIPLET FORMATION
- Publication number 20220238380
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Anton J. DEVILLIERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS REGIONS FOR THREE-DIMENSION CHIPLET FORMATION
- Publication number 20220238328
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Anton J. DEVILLIERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING SEMICONDUCTOR FILM THICKNESS
- Publication number 20220066317
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE DEPOSITION TUNING OF STRESS TO CONTROL WAFER BOW IN SEMICO...
- Publication number 20210366792
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PATTERN REDUCTION USING A STAIRCASE SPACER
- Publication number 20210366713
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PATTERN REDUCTION USING A STAIRCASE SPACER
- Publication number 20210366714
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Liquid Dispense and Coverage Control
- Publication number 20210339276
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Mirko VUKOVIC
- G01 - MEASURING TESTING
Information Patent Application
Planarizing Organic Films
- Publication number 20210294148
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Jodi Grzeskowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING A NARROW TRENCH
- Publication number 20210088904
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Anton J. DEVILLIERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Increasing Pattern Density on a Wafer
- Publication number 20210035815
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Sanjana Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TUNING STRESS TRANSITIONS OF FILMS ON A SUBSTRATE
- Publication number 20210020435
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PLANARIZATION OF SPIN-ON AND CVD-DEPOSITED ORGANIC FILMS
- Publication number 20210020453
- Publication date Jan 21, 2021
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR LAYER BY LAYER GROWTH OF CONFORMAL FILMS
- Publication number 20200152448
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Jodi GRZESKOWIAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PLANARIZATION OF ORGANIC FILMS
- Publication number 20200152472
- Publication date May 14, 2020
- Tokyo Electron Limited
- Anton DEVILLIERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Tuning Thickness of Resist Films
- Publication number 20190287793
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE
- Publication number 20190035646
- Publication date Jan 31, 2019
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Location-Specific Tuning of Stress to Control Bow to Control Overla...
- Publication number 20180068860
- Publication date Mar 8, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Location-Specific Tuning of Stress to Control Bow to Control Overla...
- Publication number 20180068859
- Publication date Mar 8, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Shifting Critical Dimensions of Patterned Films
- Publication number 20150212421
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate Tuning System and Method Using Optical Projection
- Publication number 20150147827
- Publication date May 28, 2015
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS

Daniel Fulford

Person

Patents Grantslast 30 patents

Precision multi-axis photolithography alignment correction using st...

In-situ lithography pattern enhancement with localized stress treat...

Method for tuning stress transitions of films on a substrate

System for backside deposition of a substrate

System and method for liquid dispense and coverage control

Method for pattern reduction using a staircase spacer

Method of forming a narrow trench

Method for pattern reduction using a staircase spacer

Localized stress regions for three-dimension chiplet formation

Localized stress regions for three-dimension chiplet formation

Controlling semiconductor film thickness

Method for planarization of organic films

Method for planarization of spin-on and CVD-deposited organic films

Method for layer by layer growth of conformal films

Method for increasing pattern density on a wafer

Location-specific tuning of stress to control bow to control overla...

Location-specific tuning of stress to control bow to control overla...

System and method for shifting critical dimensions of patterned films

Substrate tuning system and method using optical projection

Methods for treating a substrate by optical projection of a correct...

Patents Applicationslast 30 patents

THREE-DIMENSIONAL MULTIPLE LOCATION COMPRESSING BONDED ARM-POISEDON...

IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...

SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE

System and Method for Liquid Dispense and Coverage Control

IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...

METHOD FOR CHUCK COMPENSATION VIA WAFER SHAPE CONTROL

IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...

METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR...

PRECISION MULTI-AXIS PHOTOLITHOGRAPHY ALIGNMENT CORRECTION USING ST...

Methods of Forming Patterns

LOCALIZED STRESS REGIONS FOR THREE-DIMENSION CHIPLET FORMATION

LOCALIZED STRESS REGIONS FOR THREE-DIMENSION CHIPLET FORMATION

CONTROLLING SEMICONDUCTOR FILM THICKNESS

BACKSIDE DEPOSITION TUNING OF STRESS TO CONTROL WAFER BOW IN SEMICO...

METHOD FOR PATTERN REDUCTION USING A STAIRCASE SPACER

METHOD FOR PATTERN REDUCTION USING A STAIRCASE SPACER

System and Method for Liquid Dispense and Coverage Control

Planarizing Organic Films

METHOD OF FORMING A NARROW TRENCH

Method for Increasing Pattern Density on a Wafer

METHOD FOR TUNING STRESS TRANSITIONS OF FILMS ON A SUBSTRATE

METHOD FOR PLANARIZATION OF SPIN-ON AND CVD-DEPOSITED ORGANIC FILMS

METHOD FOR LAYER BY LAYER GROWTH OF CONFORMAL FILMS

METHOD FOR PLANARIZATION OF ORGANIC FILMS

System and Method for Tuning Thickness of Resist Films

SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE

Location-Specific Tuning of Stress to Control Bow to Control Overla...

Location-Specific Tuning of Stress to Control Bow to Control Overla...

System and Method for Shifting Critical Dimensions of Patterned Films

Substrate Tuning System and Method Using Optical Projection