Daniel Jason Riggs

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 11,096,266
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 10,674,591
- Issue date Jun 2, 2020
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 10,314,153
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for controlling EUV energy generation using pul...
- Patent number 9,980,359
- Issue date May 22, 2018
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for stabilization of droplet-plasma interaction...
- Patent number 9,832,854
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 9,820,368
- Issue date Nov 14, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV LPP source with improved dose control by combining pulse modula...
- Patent number 9,755,396
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Paul Frihauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilizing EUV light power in an extreme ultraviolet light source
- Patent number 9,713,240
- Issue date Jul 18, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods to avoid instability conditions in a source pla...
- Patent number 9,536,631
- Issue date Jan 3, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for controlling source laser firing in an LPP EUV...
- Patent number 9,426,872
- Issue date Aug 23, 2016
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for extending gas life in a two chamber gas disch...
- Patent number 9,240,664
- Issue date Jan 19, 2016
- Cymer, LLC
- Daniel J. Riggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for adjusting seed laser pulse width to control E...
- Patent number 9,000,403
- Issue date Apr 7, 2015
- ASML Netherlands B.V.
- James Crouch
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for high accuracy gas refill in a two chamber gas...
- Patent number 8,873,600
- Issue date Oct 28, 2014
- Cymer, LLC
- Rui Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling gas concentration in a two-chambe...
- Patent number 8,767,791
- Issue date Jul 1, 2014
- Cymer, LLC
- Daniel J. Riggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for high accuracy gas inject in a two chamber gas...
- Patent number 8,681,832
- Issue date Mar 25, 2014
- Cymer, Inc.
- Daniel J. Riggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method to optimize extreme ultraviolet light generation
- Patent number 8,598,552
- Issue date Dec 3, 2013
- Cymer, Inc.
- Paul Frihauf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for automatic gas optimization in a two-chamber g...
- Patent number 8,411,720
- Issue date Apr 2, 2013
- Cymer, Inc.
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced laser wavelength control
- Patent number 8,254,420
- Issue date Aug 28, 2012
- Cymer, Inc.
- Daniel J. Riggs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
DROPLET DETECTION METROLOGY UTILIZING METROLOGY BEAM SCATTERING
- Publication number 20240361222
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Dustin Michael Urone
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT
- Publication number 20230269858
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Poorya Haghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20230018949
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20200260564
- Publication date Aug 13, 2020
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20190254152
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20180139831
- Publication date May 17, 2018
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR STABILIZATION OF DROPLET-PLASMA INTERACTION...
- Publication number 20170048959
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
Target Expansion Rate Control in an Extreme Ultraviolet Light Source
- Publication number 20170048957
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PUL...
- Publication number 20170048960
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Stabilizing EUV Light Power in an Extreme Ultraviolet Light Source
- Publication number 20170048958
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method To Optimize Extreme Ultraviolet Light Generation
- Publication number 20130320244
- Publication date Dec 5, 2013
- Cymer, Inc.
- Paul Frihauf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method for Extending Gas Life in a Two Chamber Gas Disch...
- Publication number 20130170516
- Publication date Jul 4, 2013
- Cymer, Inc.
- Daniel J. Riggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for High Accuracy Gas Inject in a Two Chamber Gas...
- Publication number 20130083818
- Publication date Apr 4, 2013
- Cymer, Inc.
- Daniel J. Riggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Automatic Gas Optimization in a Two-Chamber G...
- Publication number 20130003773
- Publication date Jan 3, 2013
- Cymer, Inc.
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for High Accuracy Gas Refill in a Two Chamber Gas...
- Publication number 20130000773
- Publication date Jan 3, 2013
- Cymer, Inc.
- Rui Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Controlling Gas Concentration in a Two-Chambe...
- Publication number 20120275481
- Publication date Nov 1, 2012
- Daniel J. Riggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED LASER WAVELENGTH CONTROL
- Publication number 20110116522
- Publication date May 19, 2011
- Daniel J. Riggs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laser gas injection system
- Publication number 20080205472
- Publication date Aug 28, 2008
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Daniel Jason Riggs

Person

Patents Grantslast 30 patents

Calibration system for an extreme ultraviolet light source

Target expansion rate control in an extreme ultraviolet light source

Target expansion rate control in an extreme ultraviolet light source

Target expansion rate control in an extreme ultraviolet light source

Systems and methods for controlling EUV energy generation using pul...

Systems and methods for stabilization of droplet-plasma interaction...

Target expansion rate control in an extreme ultraviolet light source

EUV LPP source with improved dose control by combining pulse modula...

Stabilizing EUV light power in an extreme ultraviolet light source

Systems and methods to avoid instability conditions in a source pla...

System and method for controlling source laser firing in an LPP EUV...

System and method for extending gas life in a two chamber gas disch...

System and method for adjusting seed laser pulse width to control E...

System and method for high accuracy gas refill in a two chamber gas...

System and method for controlling gas concentration in a two-chambe...

System and method for high accuracy gas inject in a two chamber gas...

System and method to optimize extreme ultraviolet light generation

System and method for automatic gas optimization in a two-chamber g...

Advanced laser wavelength control

Patents Applicationslast 30 patents

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

DROPLET DETECTION METROLOGY UTILIZING METROLOGY BEAM SCATTERING

SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

SYSTEMS AND METHODS FOR STABILIZATION OF DROPLET-PLASMA INTERACTION...

Target Expansion Rate Control in an Extreme Ultraviolet Light Source

SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PUL...

Stabilizing EUV Light Power in an Extreme Ultraviolet Light Source

System and Method To Optimize Extreme Ultraviolet Light Generation

System and Method for Extending Gas Life in a Two Chamber Gas Disch...

System and Method for High Accuracy Gas Inject in a Two Chamber Gas...

System and Method for Automatic Gas Optimization in a Two-Chamber G...

System and Method for High Accuracy Gas Refill in a Two Chamber Gas...

System and Method for Controlling Gas Concentration in a Two-Chambe...

ADVANCED LASER WAVELENGTH CONTROL

Laser gas injection system