Daniel Kraehmer

Person

Essingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 9,964,859
- Issue date May 8, 2018
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source for generating a usable output beam for a projecti...
- Patent number 9,955,563
- Issue date Apr 24, 2018
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,733,395
- Issue date Aug 15, 2017
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Collector
- Patent number 9,645,503
- Issue date May 9, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system for an EUV lithography device and facet mirror...
- Patent number 9,551,941
- Issue date Jan 24, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for EUV lithography, EUV lithography system and method for opt...
- Patent number 9,535,332
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 9,316,922
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography projection objective
- Patent number 9,097,984
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography with stray light compensa...
- Patent number 9,063,439
- Issue date Jun 23, 2015
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for a microlithographic projection exposure apparatus
- Patent number 8,922,753
- Issue date Dec 30, 2014
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 8,879,159
- Issue date Nov 4, 2014
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 8,767,181
- Issue date Jul 1, 2014
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for microlithography
- Patent number 8,456,616
- Issue date Jun 4, 2013
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Combination stop for catoptric projection arrangement
- Patent number 8,436,985
- Issue date May 7, 2013
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
High transmission, high aperture catadioptric projection objective...
- Patent number 8,345,222
- Issue date Jan 1, 2013
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,325,426
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Polarization-modulating optical element and method for manufacturin...
- Patent number 8,213,079
- Issue date Jul 3, 2012
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Combination stop for catoptric projection arrangement
- Patent number 8,208,127
- Issue date Jun 26, 2012
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Optimization and matching of optical systems by use of orientation...
- Patent number 8,126,669
- Issue date Feb 28, 2012
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G01 - MEASURING TESTING
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 8,054,557
- Issue date Nov 8, 2011
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system or projection lens of a microlithographic expos...
- Patent number 8,031,326
- Issue date Oct 4, 2011
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,982,969
- Issue date Jul 19, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Method for determining intensity distribution in the image plane of...
- Patent number 7,961,297
- Issue date Jun 14, 2011
- Carl Zeiss SMS GmbH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization-modulating optical element and method for manufacturin...
- Patent number 7,903,333
- Issue date Mar 8, 2011
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,847,921
- Issue date Dec 7, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method for operating the same
- Patent number 7,808,615
- Issue date Oct 5, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Method for describing, evaluating and improving optical polarizatio...
- Patent number 7,728,975
- Issue date Jun 1, 2010
- Carl Zeiss SMT AG
- Michael Totzeck
- G01 - MEASURING TESTING
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,710,640
- Issue date May 4, 2010
- Carl Zeiss SMT AG
- Susanne Beder
- G02 - OPTICS
Information Patent Grant
Symmetrical objective having four lens groups for microlithography
- Patent number 7,697,211
- Issue date Apr 13, 2010
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20190072861
- Publication date Mar 7, 2019
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20180164474
- Publication date Jun 14, 2018
- Carl Zeiss SMT GMBH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20170322343
- Publication date Nov 9, 2017
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20170192362
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20160370709
- Publication date Dec 22, 2016
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR...
- Publication number 20160004164
- Publication date Jan 7, 2016
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTI...
- Publication number 20150173163
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20140327891
- Publication date Nov 6, 2014
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140320955
- Publication date Oct 30, 2014
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140268085
- Publication date Sep 18, 2014
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
COLLECTOR
- Publication number 20140192339
- Publication date Jul 10, 2014
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPT...
- Publication number 20130100428
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Johannes RUOFF
- B82 - NANO-TECHNOLOGY
Information Patent Application
COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT
- Publication number 20120236272
- Publication date Sep 20, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20120019800
- Publication date Jan 26, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110235013
- Publication date Sep 29, 2011
- Carl Zeiss SMT GMBH
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20110222043
- Publication date Sep 15, 2011
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...
- Publication number 20110109894
- Publication date May 12, 2011
- Carl Zeiss SMT GMBH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20110069295
- Publication date Mar 24, 2011
- Carl Zeiss SMT GMBH
- Daniel Kraehmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20110069296
- Publication date Mar 24, 2011
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL
- Publication number 20100208225
- Publication date Aug 19, 2010
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20100157435
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEME...
- Publication number 20100149510
- Publication date Jun 17, 2010
- Carl Zeiss SMT AG
- Christoph ZACZEK
- G02 - OPTICS
Information Patent Application
HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE...
- Publication number 20100097592
- Publication date Apr 22, 2010
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100079741
- Publication date Apr 1, 2010
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100079739
- Publication date Apr 1, 2010
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE...
- Publication number 20090306921
- Publication date Dec 10, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20090284831
- Publication date Nov 19, 2009
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRA...
- Publication number 20090195876
- Publication date Aug 6, 2009
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G02 - OPTICS

Daniel Kraehmer

Person

Patents Grantslast 30 patents

Microlithography projection objective

Lithography projection objective, and a method for correcting image...

EUV light source for generating a usable output beam for a projecti...

Microlithographic projection exposure apparatus

Collector

Illumination system for an EUV lithography device and facet mirror...

Mask for EUV lithography, EUV lithography system and method for opt...

Lithography projection objective, and a method for correcting image...

Microlithography projection objective

Projection objective for microlithography with stray light compensa...

Optical system for a microlithographic projection exposure apparatus

Lithography projection objective, and a method for correcting image...

Microlithographic exposure method as well as a projection exposure...

Optical system for microlithography

Combination stop for catoptric projection arrangement

High transmission, high aperture catadioptric projection objective...

Projection objective of a microlithographic projection exposure app...

Polarization-modulating optical element and method for manufacturin...

Combination stop for catoptric projection arrangement

Optimization and matching of optical systems by use of orientation...

Lithography projection objective, and a method for correcting image...

Illumination system or projection lens of a microlithographic expos...

Projection objective of a microlithographic projection exposure app...

Method for determining intensity distribution in the image plane of...

Polarization-modulating optical element and method for manufacturin...

Microlithographic exposure method as well as a projection exposure...

Projection exposure apparatus and method for operating the same

Method for describing, evaluating and improving optical polarizatio...

Projection objective of a microlithographic projection exposure app...

Symmetrical objective having four lens groups for microlithography

Patents Applicationslast 30 patents

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHY PROJECTION OBJECTIVE

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR...

EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTI...

MICROLITHOGRAPHY PROJECTION OBJECTIVE

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHY PROJECTION OBJECTIVE

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

COLLECTOR

MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPT...

COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...

OPTICAL SYSTEM FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEME...

HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRA...