Daniel Kwadwo Amponsah Berkoh

Person

West Hills, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of measuring electrical characteristics during plasma etching
- Patent number 10,453,697
- Issue date Oct 22, 2019
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of measuring electrical characteristics during plasma etching
- Patent number 10,083,838
- Issue date Sep 25, 2018
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for shielding a plasma etcher electrode
- Patent number 9,905,484
- Issue date Feb 27, 2018
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint booster systems and methods for optical endpoint detection
- Patent number 9,870,963
- Issue date Jan 16, 2018
- Skyworks Solutions, Inc.
- Elena Becerra Woodard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices for methodologies related to wafer carriers
- Patent number 9,865,491
- Issue date Jan 9, 2018
- Skyworks Solutions, Inc.
- Elena Becerra Woodard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching through-wafer vias in a wafer
- Patent number 9,711,364
- Issue date Jul 18, 2017
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices for methodologies related to wafer carriers
- Patent number 9,576,838
- Issue date Feb 21, 2017
- Skyworks Solutions, Inc.
- Elena Becerra Woodard
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and methods for shielding a plasma etcher electrode
- Patent number 9,478,428
- Issue date Oct 25, 2016
- Skyworks Solutions, Inc.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for electrical measurements in a plasma etcher
- Patent number 8,357,263
- Issue date Jan 22, 2013
- Skyworks Solutions, Inc.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING
- Publication number 20190057875
- Publication date Feb 21, 2019
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR OPTICAL ENDPOINT DETECTION USING AN ENDPOINT BOOSTER
- Publication number 20180286768
- Publication date Oct 4, 2018
- SKYWORKS SOLUTIONS, INC.
- Elena Becerra Woodard
- G01 - MEASURING TESTING
Information Patent Application
ENDPOINT BOOSTER SYSTEMS
- Publication number 20180197797
- Publication date Jul 12, 2018
- SKYWORKS SOLUTIONS, INC.
- Elena Becerra Woodard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING
- Publication number 20180061651
- Publication date Mar 1, 2018
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS
- Publication number 20170125275
- Publication date May 4, 2017
- SKYWORKS SOLUTIONS, INC.
- Elena Becerra Woodard
- B32 - LAYERED PRODUCTS
Information Patent Application
METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE
- Publication number 20160315021
- Publication date Oct 27, 2016
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT BOOSTER SYSTEMS AND METHODS FOR OPTICAL ENDPOINT DETECTION
- Publication number 20160005666
- Publication date Jan 7, 2016
- SKYWORKS SOLUTIONS, INC.
- Elena Becerra Woodard
- G01 - MEASURING TESTING
Information Patent Application
DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS
- Publication number 20160005637
- Publication date Jan 7, 2016
- SKYWORKS SOLUTIONS, INC.
- Elena Becerra Woodard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING THROUGH-WAFER VIAS IN A WAFER
- Publication number 20140191415
- Publication date Jul 10, 2014
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR FOCUSING PLASMA
- Publication number 20120083129
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ELECTRICAL MEASUREMENTS IN A PLASMA ETCHER
- Publication number 20120083051
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE
- Publication number 20120083130
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS
- Publication number 20120080832
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Elena B. Woodard
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Daniel Kwadwo Amponsah Berkoh

Person

Patents Grantslast 30 patents

Methods of measuring electrical characteristics during plasma etching

Methods of measuring electrical characteristics during plasma etching

Methods for shielding a plasma etcher electrode

Endpoint booster systems and methods for optical endpoint detection

Devices for methodologies related to wafer carriers

Methods for etching through-wafer vias in a wafer

Devices for methodologies related to wafer carriers

Apparatus and methods for shielding a plasma etcher electrode

Apparatus and methods for electrical measurements in a plasma etcher

Patents Applicationslast 30 patents

METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING

METHODS FOR OPTICAL ENDPOINT DETECTION USING AN ENDPOINT BOOSTER

ENDPOINT BOOSTER SYSTEMS

METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING

DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS

METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE

ENDPOINT BOOSTER SYSTEMS AND METHODS FOR OPTICAL ENDPOINT DETECTION

DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS

METHODS FOR ETCHING THROUGH-WAFER VIAS IN A WAFER

APPARATUS AND METHODS FOR FOCUSING PLASMA

APPARATUS AND METHODS FOR ELECTRICAL MEASUREMENTS IN A PLASMA ETCHER

APPARATUS AND METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE

DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS