Daniel P. Aubin

Person

Rockville, RI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Isolation of novolak resin by low temperature sub surface forced st...
- Patent number 6,165,675
- Issue date Dec 26, 2000
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionation of phenol formaldehyde condensate and photoresist com...
- Patent number 5,976,761
- Issue date Nov 2, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in photoresist compositions by chelating ion ex...
- Patent number 5,962,183
- Issue date Oct 5, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Image formation utilizing photosensitive compositions containing lo...
- Patent number 5,858,627
- Issue date Jan 12, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinonediazide positive photoresist utilizing mixed solvent consist...
- Patent number 5,853,947
- Issue date Dec 29, 1998
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinone diazide compositions containing low metals p-cresol oligome...
- Patent number 5,837,417
- Issue date Nov 17, 1998
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing surfactant having a low metal ion level and d...
- Patent number 5,750,031
- Issue date May 12, 1998
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Isolation of novolak resin by low temperature sub surface forced st...
- Patent number 5,750,632
- Issue date May 12, 1998
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionation of phenol formaldehyde condensate and photoresist com...
- Patent number 5,739,265
- Issue date Apr 14, 1998
- Clariant Finance (BVI) Ltd.
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionation of phenol formaldehyde condensate and photoresist com...
- Patent number 5,693,749
- Issue date Dec 2, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of using a Lewis base to control molecular weight of novolak...
- Patent number 5,688,893
- Issue date Nov 18, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acidic ion exchange resin as a catalyst to synthesize a novolak res...
- Patent number 5,665,517
- Issue date Sep 9, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylet...
- Patent number 5,656,413
- Issue date Aug 12, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Using a Lewis base to control molecular weight of novolak resins
- Patent number 5,614,349
- Issue date Mar 25, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in novolak resin using an ion exchange catalyst...
- Patent number 5,521,052
- Issue date May 28, 1996
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in the raw materials and using a Lewis base to...
- Patent number 5,476,750
- Issue date Dec 19, 1995
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Daniel P. Aubin

Person

Patents Grantslast 30 patents

Isolation of novolak resin by low temperature sub surface forced st...

Fractionation of phenol formaldehyde condensate and photoresist com...

Metal ion reduction in photoresist compositions by chelating ion ex...

Image formation utilizing photosensitive compositions containing lo...

Quinonediazide positive photoresist utilizing mixed solvent consist...

Quinone diazide compositions containing low metals p-cresol oligome...

Process for producing surfactant having a low metal ion level and d...

Isolation of novolak resin by low temperature sub surface forced st...

Fractionation of phenol formaldehyde condensate and photoresist com...

Fractionation of phenol formaldehyde condensate and photoresist com...

Method of using a Lewis base to control molecular weight of novolak...

Acidic ion exchange resin as a catalyst to synthesize a novolak res...

Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylet...

Using a Lewis base to control molecular weight of novolak resins

Metal ion reduction in novolak resin using an ion exchange catalyst...

Metal ion reduction in the raw materials and using a Lewis base to...