Daniel P. Sanders

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Expert-in-the-loop AI for materials discovery
- Patent number 12,135,927
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Petar Ristoski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating metal-oxide film
- Patent number 12,110,592
- Issue date Oct 8, 2024
- International Business Machines Corporation
- Wyatt Thornley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-priming resist for generic inorganic hardmasks
- Patent number 11,226,561
- Issue date Jan 18, 2022
- International Business Machines Corporation
- Chi-Chun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and composition for forming organic film
- Patent number 11,022,882
- Issue date Jun 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoactive polymer brush materials and EUV patterning using the same
- Patent number 10,831,102
- Issue date Nov 10, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating electrically nonconductive blocks using a polymer brush...
- Patent number 10,755,928
- Issue date Aug 25, 2020
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded etch rate reference layer for enhanced etch time precision
- Patent number 10,748,823
- Issue date Aug 18, 2020
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, method for manufacturing the compound, and composition fo...
- Patent number 10,604,618
- Issue date Mar 31, 2020
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-tone resist compositions and multifunctional polymers therein
- Patent number 10,345,700
- Issue date Jul 9, 2019
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Block copolymers with surface-active junction groups, compositions...
- Patent number 10,259,907
- Issue date Apr 16, 2019
- AZ Electronic Materials (Luxembourg) S.à r.l.
- Ankit Vora
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of forming block polymers for directed self-assembly
- Patent number 10,118,989
- Issue date Nov 6, 2018
- International Business Machines Corporation
- Anindarupa Chunder
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Additives for orientation control of block copolymers
- Patent number 10,066,040
- Issue date Sep 4, 2018
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Hybrid topographical and chemical pre-patterns for directed self-as...
- Patent number 10,059,820
- Issue date Aug 28, 2018
- International Business Machines Corporation
- Markus Brink
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Thin film self assembly of topcoat-free silicon-containing diblock...
- Patent number 9,982,097
- Issue date May 29, 2018
- International Business Machines Corporation
- Noel Arellano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated sulfonate esters of aryl ketones for non-ionic photo-ac...
- Patent number 9,983,475
- Issue date May 29, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic aryl ketone based polymeric photo-acid generators
- Patent number 9,951,164
- Issue date Apr 24, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic low diffusing photo-acid generators
- Patent number 9,950,999
- Issue date Apr 24, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block copolymers for directed self-assembly applications
- Patent number 9,879,152
- Issue date Jan 30, 2018
- International Business Machines Corporation
- Noel Arellano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-chi block copolymers for interconnect structures by directed s...
- Patent number 9,768,059
- Issue date Sep 19, 2017
- International Business Machines Corporation
- Chi-Chun Liu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Hybrid topographical and chemical pre-patterns for directed self-as...
- Patent number 9,738,765
- Issue date Aug 22, 2017
- International Business Machines Corporation
- Markus Brink
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluoro-alcohol additives for orientation control of block copolymers
- Patent number 9,574,107
- Issue date Feb 21, 2017
- International Business Machines Corporation
- Joy Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming block polymers for directed self-assembly
- Patent number 9,562,127
- Issue date Feb 7, 2017
- International Business Machines Corporation
- Joy Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Additives for orientation control of block copolymers
- Patent number 9,458,353
- Issue date Oct 4, 2016
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sulfonamide-containing topcoat and photoresist additive composition...
- Patent number 9,422,445
- Issue date Aug 23, 2016
- International Business Machines Corporation
- Daniel Paul Sanders
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of ring-opening polymerization, and related compositions and...
- Patent number 9,388,275
- Issue date Jul 12, 2016
- International Business Machines Corporation
- Olivier Coulembier
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 9,250,529
- Issue date Feb 2, 2016
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic photo-acid generating polymers for resist applications
- Patent number 9,244,345
- Issue date Jan 26, 2016
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for improving self-assembled polymer features
- Patent number 9,233,840
- Issue date Jan 12, 2016
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sulfonamide-containing photoresist compositions and methods of use
- Patent number 9,223,209
- Issue date Dec 29, 2015
- International Business Machines Corporation
- Daniel Paul Sanders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonamide-containing topcoat and photoresist additive composition...
- Patent number 9,223,217
- Issue date Dec 29, 2015
- International Business Machines Corporation
- Daniel Paul Sanders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
GENERATING METAL-OXIDE FILM
- Publication number 20220090265
- Publication date Mar 24, 2022
- International Business Machines Corporation
- Wyatt Thornley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXPERT-IN-THE-LOOP AI FOR MATERIALS GENERATION
- Publication number 20210304852
- Publication date Sep 30, 2021
- International Business Machines Corporation
- Petar Ristoski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPERT-IN-THE-LOOP AI FOR MATERIALS DISCOVERY
- Publication number 20210303762
- Publication date Sep 30, 2021
- International Business Machines Corporation
- Petar Ristoski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIFUNCTIONAL POLYMERS
- Publication number 20200278607
- Publication date Sep 3, 2020
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FABRICATING ELECTRICALLY NONCONDUCTIVE BLOCKS USING A POLYMER BRUSH...
- Publication number 20200243335
- Publication date Jul 30, 2020
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED ETCH RATE REFERENCE LAYER FOR ENHANCED ETCH TIME PRECISION
- Publication number 20200105628
- Publication date Apr 2, 2020
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-PRIMING RESIST FOR GENERIC INORGANIC HARDMASKS
- Publication number 20200050108
- Publication date Feb 13, 2020
- International Business Machines Corporation
- Chi-Chun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND AND COMPOSITION FOR FORMING ORGANIC FILM
- Publication number 20190391493
- Publication date Dec 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, METHOD FOR MANUFACTURING THE COMPOUND, AND COMPOSITION FO...
- Publication number 20190390000
- Publication date Dec 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME
- Publication number 20190271913
- Publication date Sep 5, 2019
- International Business Machines Corporation
- Ekmini A. De Silva
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS
- Publication number 20180044284
- Publication date Feb 15, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
- Publication number 20180044459
- Publication date Feb 15, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-AC...
- Publication number 20180046077
- Publication date Feb 15, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-AS...
- Publication number 20170321025
- Publication date Nov 9, 2017
- International Business Machines Corporation
- Markus Brink
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
HIGH-CHI BLOCK COPOLYMERS FOR INTERCONNECT STRUCTURES BY DIRECTED S...
- Publication number 20170294341
- Publication date Oct 12, 2017
- International Business Machines Corporation
- Chi-Chun Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK...
- Publication number 20170233532
- Publication date Aug 17, 2017
- International Business Machines Corporation
- Noel Arellano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS
- Publication number 20170114246
- Publication date Apr 27, 2017
- International Business Machines Corporation
- Noel Arellano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS OF FORMING BLOCK POLYMERS FOR DIRECTED SELF-ASSEMBLY
- Publication number 20170114183
- Publication date Apr 27, 2017
- International Business Machines Corporation
- Anindarupa Chunder
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS
- Publication number 20160362513
- Publication date Dec 15, 2016
- International Business Machines Corporation
- Joy Cheng
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS
- Publication number 20160304740
- Publication date Oct 20, 2016
- International Business Machines Corporation
- Joy Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BLOCK COPOLYMERS WITH SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS...
- Publication number 20160244557
- Publication date Aug 25, 2016
- International Business Machines Corporation
- Ankit VORA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-AS...
- Publication number 20160244581
- Publication date Aug 25, 2016
- International Business Machines Corporation
- Markus Brink
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FLUORO-ALCOHOL ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS
- Publication number 20160237307
- Publication date Aug 18, 2016
- International Business Machines Corporation
- Joy Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN
- Publication number 20160070169
- Publication date Mar 10, 2016
- SHIN-ETSU CHEMICAL CO., LTD.
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonamide-Containing Topcoat and Photoresist Additive Composition...
- Publication number 20160053129
- Publication date Feb 25, 2016
- CENTRAL GLASS CO., LTD.
- Daniel Paul Sanders
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS OF FORMING BLOCK POLYMERS FOR DIRECTED SELF-ASSEMBLY
- Publication number 20150329664
- Publication date Nov 19, 2015
- International Business Machines Corporation
- Joy Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-...
- Publication number 20150195916
- Publication date Jul 9, 2015
- International Business Machines Corporation
- Joy Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS OF REDUCING DEFECTS IN DIRECTED SELF-ASSEMBLED STRUCTURES
- Publication number 20140273476
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SEMICONDUCTOR INTERCONNECT STRUCTURE HAVING ENHANCED PERFORMANCE AN...
- Publication number 20140070418
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ORIENTATION OF DOMAINS IN BLOCK COPOLYMER FILMS
- Publication number 20130274380
- Publication date Oct 17, 2013
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Daniel P. Sanders

Person

Patents Grantslast 30 patents

Expert-in-the-loop AI for materials discovery

Generating metal-oxide film

Self-priming resist for generic inorganic hardmasks

Compound and composition for forming organic film

Photoactive polymer brush materials and EUV patterning using the same

Fabricating electrically nonconductive blocks using a polymer brush...

Embedded etch rate reference layer for enhanced etch time precision

Compound, method for manufacturing the compound, and composition fo...

Negative-tone resist compositions and multifunctional polymers therein

Block copolymers with surface-active junction groups, compositions...

Methods of forming block polymers for directed self-assembly

Additives for orientation control of block copolymers

Hybrid topographical and chemical pre-patterns for directed self-as...

Thin film self assembly of topcoat-free silicon-containing diblock...

Fluorinated sulfonate esters of aryl ketones for non-ionic photo-ac...

Non-ionic aryl ketone based polymeric photo-acid generators

Non-ionic low diffusing photo-acid generators

Block copolymers for directed self-assembly applications

High-chi block copolymers for interconnect structures by directed s...

Hybrid topographical and chemical pre-patterns for directed self-as...

Fluoro-alcohol additives for orientation control of block copolymers

Methods of forming block polymers for directed self-assembly

Additives for orientation control of block copolymers

Sulfonamide-containing topcoat and photoresist additive composition...

Method of ring-opening polymerization, and related compositions and...

Photoresist compositions and methods of use in high index immersion...

Non-ionic photo-acid generating polymers for resist applications

Method for improving self-assembled polymer features

Sulfonamide-containing photoresist compositions and methods of use

Sulfonamide-containing topcoat and photoresist additive composition...

Patents Applicationslast 30 patents

GENERATING METAL-OXIDE FILM

EXPERT-IN-THE-LOOP AI FOR MATERIALS GENERATION

EXPERT-IN-THE-LOOP AI FOR MATERIALS DISCOVERY

MULTIFUNCTIONAL POLYMERS

FABRICATING ELECTRICALLY NONCONDUCTIVE BLOCKS USING A POLYMER BRUSH...

EMBEDDED ETCH RATE REFERENCE LAYER FOR ENHANCED ETCH TIME PRECISION

SELF-PRIMING RESIST FOR GENERIC INORGANIC HARDMASKS

COMPOUND AND COMPOSITION FOR FORMING ORGANIC FILM

COMPOUND, METHOD FOR MANUFACTURING THE COMPOUND, AND COMPOSITION FO...

PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME

NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS

NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS

FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-AC...

HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-AS...

HIGH-CHI BLOCK COPOLYMERS FOR INTERCONNECT STRUCTURES BY DIRECTED S...

THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK...

BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS

METHODS OF FORMING BLOCK POLYMERS FOR DIRECTED SELF-ASSEMBLY

ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS

ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS

BLOCK COPOLYMERS WITH SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS...

HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-AS...

FLUORO-ALCOHOL ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS

NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN

Sulfonamide-Containing Topcoat and Photoresist Additive Composition...

METHODS OF FORMING BLOCK POLYMERS FOR DIRECTED SELF-ASSEMBLY

FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-...

METHODS OF REDUCING DEFECTS IN DIRECTED SELF-ASSEMBLED STRUCTURES

SEMICONDUCTOR INTERCONNECT STRUCTURE HAVING ENHANCED PERFORMANCE AN...

METHOD OF CONTROLLING ORIENTATION OF DOMAINS IN BLOCK COPOLYMER FILMS