Daniela White

Person

Oswego, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
CMP compositions containing a soluble peroxometalate complex and me...
- Patent number 8,541,310
- Issue date Sep 24, 2013
- Cabot Microelectronics Corporation
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polyoxometalate compositions and methods
- Patent number 8,057,561
- Issue date Nov 15, 2011
- Cabot Microelectronics Corporation
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ruthenium CMP compositions and methods
- Patent number 8,008,202
- Issue date Aug 30, 2011
- Cabot Microelectronics Corporation
- Daniela White
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition and method utilizing abrasive particles treat...
- Patent number 7,994,057
- Issue date Aug 9, 2011
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Copper-passivating CMP compositions and methods
- Patent number 7,955,520
- Issue date Jun 7, 2011
- Cabot Microelectronics Corporation
- Daniela White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low pH barrier slurry based on titanium dioxide
- Patent number 7,803,711
- Issue date Sep 28, 2010
- Cabot Microelectronics Corporation
- Daniela White
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Copper-passivating CMP compositions and methods
- Publication number 20090134122
- Publication date May 28, 2009
- Daniela White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SLURRIES FOR POLISHING OXIDE AND NITRIDE WITH HIGH REMOVAL RATES
- Publication number 20090090696
- Publication date Apr 9, 2009
- Cabot Microelectronics Corporation
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREAT...
- Publication number 20090081871
- Publication date Mar 26, 2009
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LOW PH BARRIER SLURRY BASED ON TITANIUM DIOXIDE
- Publication number 20090075566
- Publication date Mar 19, 2009
- Cabot Microelectronics Corporation
- Daniela White
- B24 - GRINDING POLISHING
Information Patent Application
Copper CMP composition containing ionic polyelectrolyte and method
- Publication number 20090056231
- Publication date Mar 5, 2009
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Ruthenium CMP compositions and methods
- Publication number 20090035942
- Publication date Feb 5, 2009
- Daniela White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP compositions containing a soluble peroxometalate complex and me...
- Publication number 20080274619
- Publication date Nov 6, 2008
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polyoxometalate compositions and methods
- Publication number 20080060277
- Publication date Mar 13, 2008
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Daniela White

Person

Patents Grantslast 30 patents

CMP compositions containing a soluble peroxometalate complex and me...

Polyoxometalate compositions and methods

Ruthenium CMP compositions and methods

Polishing composition and method utilizing abrasive particles treat...

Copper-passivating CMP compositions and methods

Low pH barrier slurry based on titanium dioxide

Patents Applicationslast 30 patents

Copper-passivating CMP compositions and methods

SLURRIES FOR POLISHING OXIDE AND NITRIDE WITH HIGH REMOVAL RATES

POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREAT...

LOW PH BARRIER SLURRY BASED ON TITANIUM DIOXIDE

Copper CMP composition containing ionic polyelectrolyte and method

Ruthenium CMP compositions and methods

CMP compositions containing a soluble peroxometalate complex and me...

Polyoxometalate compositions and methods