Danping Peng

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Machine learning based model builder and its applications for patte...
- Patent number 12,112,116
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Zhiru Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of preparing photo mask data and manufacturing a photo mask
- Patent number 12,056,431
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Zhiru Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist features
- Patent number 11,829,066
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Synchronized parallel tile computation for large area lithography s...
- Patent number 11,747,786
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Danping Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Machine learning based model builder and its applications for patte...
- Patent number 11,610,043
- Issue date Mar 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zhiru Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic mask correction using volume correction techniques
- Patent number 11,531,273
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zhiru Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synchronized parallel tile computation for large area lithography s...
- Patent number 11,340,584
- Issue date May 24, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Danping Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist features
- Patent number 10,990,002
- Issue date Apr 27, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Synchronized parallel tile computation for large area lithography s...
- Patent number 10,915,090
- Issue date Feb 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Danping Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Synchronized parallel tile computation for large area lithography s...
- Patent number 10,671,052
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Daniel Beylkin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photo-mask acceptance technique
- Patent number 8,458,622
- Issue date Jun 4, 2013
- Luminescent Technologies, Inc.
- Linyong Pang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 8,056,021
- Issue date Nov 8, 2011
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,992,109
- Issue date Aug 2, 2011
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,984,391
- Issue date Jul 19, 2011
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Physical-resist model using fast sweeping
- Patent number 7,805,700
- Issue date Sep 28, 2010
- Luminescent Technologies, Inc.
- Danping Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask-patterns including intentional breaks
- Patent number 7,793,253
- Issue date Sep 7, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,757,201
- Issue date Jul 13, 2010
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems, masks, and methods for photolithography
- Patent number 7,707,541
- Issue date Apr 27, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Technique for determining a mask pattern corresponding to a photo-mask
- Patent number 7,703,068
- Issue date Apr 20, 2010
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, masks, and methods for photomasks optimized with approximat...
- Patent number 7,703,049
- Issue date Apr 20, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimized photomasks for photolithography
- Patent number 7,571,423
- Issue date Aug 4, 2009
- Luminescent Technologies, Inc.
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimized photomasks for photolithography
- Patent number 7,480,889
- Issue date Jan 20, 2009
- Luminescent Technologies, Inc.
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,441,227
- Issue date Oct 21, 2008
- Luminescent Technologies Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,178,127
- Issue date Feb 13, 2007
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,124,394
- Issue date Oct 17, 2006
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MATERIAL PROCESSING MODELING
- Publication number 20240378327
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Danping PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTE...
- Publication number 20240370636
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zhiru YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK
- Publication number 20240362396
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zhiru YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM
- Publication number 20240003827
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chien-Lin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-RESOLUTION ASSIST FEATURES
- Publication number 20230384665
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTE...
- Publication number 20230118656
- Publication date Apr 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zhiru YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK
- Publication number 20230066219
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zhiru YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Synchronized Parallel Tile Computation for Large Area Lithography S...
- Publication number 20220291659
- Publication date Sep 15, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Danping Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTE...
- Publication number 20220284166
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zhiru YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Sub-Resolution Assist Features
- Publication number 20210247689
- Publication date Aug 12, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Synchronized Parallel Tile Computation for Large Area Lithography S...
- Publication number 20210181713
- Publication date Jun 17, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Danping Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC MASK CORRECTION USING VOLUME CORRECTION TECHNIQUES
- Publication number 20210072648
- Publication date Mar 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zhiru YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sub-Resolution Assist Features
- Publication number 20210026237
- Publication date Jan 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Synchronized Parallel Tile Computation for Large Area Lithography S...
- Publication number 20200293023
- Publication date Sep 17, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Danping Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Synchronized Parallel Tile Computation For Large Area Lithography...
- Publication number 20190146455
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Daniel Beylkin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask Acceptance Technique
- Publication number 20120134542
- Publication date May 31, 2012
- Linyong Pang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20100275175
- Publication date Oct 28, 2010
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20100275176
- Publication date Oct 28, 2010
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20100251203
- Publication date Sep 30, 2010
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Physical-Resist Model Using Fast Sweeping
- Publication number 20090013304
- Publication date Jan 8, 2009
- Danping Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask-Patterns Including Intentional Breaks
- Publication number 20070196742
- Publication date Aug 23, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20070198966
- Publication date Aug 23, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20070192756
- Publication date Aug 16, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System, Masks, and Methods for Photomasks Optimized with Approximat...
- Publication number 20070186206
- Publication date Aug 9, 2007
- Daniel S. Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems, Masks, and Methods for Photolithography
- Publication number 20070184357
- Publication date Aug 9, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20070136716
- Publication date Jun 14, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized photomasks for photolithography
- Publication number 20070011647
- Publication date Jan 11, 2007
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optimized photomasks for photolithography
- Publication number 20070011644
- Publication date Jan 11, 2007
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR TIME-EVOLVING RECTILINEAR CONTOURS REPRESENTING PHOTO MASKS
- Publication number 20070011645
- Publication date Jan 11, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems, masks and methods for printing contact holes and other pat...
- Publication number 20060172204
- Publication date Aug 3, 2006
- Danping Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Danping Peng

Person

Patents Grantslast 30 patents

Machine learning based model builder and its applications for patte...

Methods of preparing photo mask data and manufacturing a photo mask

Sub-resolution assist features

Synchronized parallel tile computation for large area lithography s...

Machine learning based model builder and its applications for patte...

Lithographic mask correction using volume correction techniques

Synchronized parallel tile computation for large area lithography s...

Sub-resolution assist features

Synchronized parallel tile computation for large area lithography s...

Synchronized parallel tile computation for large area lithography s...

Photo-mask acceptance technique

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Physical-resist model using fast sweeping

Mask-patterns including intentional breaks

Method for time-evolving rectilinear contours representing photo masks

Systems, masks, and methods for photolithography

Technique for determining a mask pattern corresponding to a photo-mask

System, masks, and methods for photomasks optimized with approximat...

Optimized photomasks for photolithography

Optimized photomasks for photolithography

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Patents Applicationslast 30 patents

MATERIAL PROCESSING MODELING

MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTE...

METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK

SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM

SUB-RESOLUTION ASSIST FEATURES

MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTE...

METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK

Synchronized Parallel Tile Computation for Large Area Lithography S...

MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTE...

Sub-Resolution Assist Features

Synchronized Parallel Tile Computation for Large Area Lithography S...

LITHOGRAPHIC MASK CORRECTION USING VOLUME CORRECTION TECHNIQUES

Sub-Resolution Assist Features

Synchronized Parallel Tile Computation for Large Area Lithography S...

Synchronized Parallel Tile Computation For Large Area Lithography...

Photo-Mask Acceptance Technique

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Physical-Resist Model Using Fast Sweeping

Mask-Patterns Including Intentional Breaks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

System, Masks, and Methods for Photomasks Optimized with Approximat...

Systems, Masks, and Methods for Photolithography

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Optimized photomasks for photolithography

Optimized photomasks for photolithography

METHOD FOR TIME-EVOLVING RECTILINEAR CONTOURS REPRESENTING PHOTO MASKS

Systems, masks and methods for printing contact holes and other pat...